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弹性喷射抛光技术中金属元素污染下单晶硅镜表面演化的研究

Research on the Surface Evolution of Single Crystal Silicon Mirror Contaminated by Metallic Elements during Elastic Jet Polishing Techniques.

作者信息

Zhang Wanli, Shi Feng, Dai Yifan, Zhong Yaoyu, Song Ci, Tian Ye

机构信息

College of Artificial Intelligence and Automation, National University of Defense Technology, 109 Deya Road, Changsha 410073, Hunan, China.

出版信息

Materials (Basel). 2019 Apr 2;12(7):1077. doi: 10.3390/ma12071077.

DOI:10.3390/ma12071077
PMID:30986902
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC6480570/
Abstract

Metallic elements can contaminate single crystal silicon mirror during ion beam etching (IBE) and other postprocessing methods, which can affect the performance of components in an infrared laser system. In this work, scanning electron microscope (SEM) and atomic force microscope (AFM) were used to characterize the distribution of contaminant represented by aluminum (Al). After characterizing contaminated area, elastic jet polishing (EJP), EJP, and static alkaline etching (SAE) combined technique were used to process the mirror. The morphology and laser-induced absorption were measured. Results show that metallic elements can mix with silicon and generate bulges due to the sputtering effect. In addition, SAE and EJP combined technique can remove metallic contaminant and stabilize the surface quality. Research results can be a reference on conducting postprocessing technologies to improve laser damage resistance property of single crystal silicon mirror in infrared laser system.

摘要

金属元素在离子束蚀刻（IBE）及其他后处理方法过程中会污染单晶硅镜，这会影响红外激光系统中部件的性能。在本工作中，使用扫描电子显微镜（SEM）和原子力显微镜（AFM）来表征以铝（Al）为代表的污染物的分布。在对污染区域进行表征之后，采用弹性喷射抛光（EJP）、EJP以及静态碱性蚀刻（SAE）组合技术对镜子进行处理。测量了其形貌和激光诱导吸收。结果表明，由于溅射效应，金属元素会与硅混合并产生凸起。此外，SAE和EJP组合技术能够去除金属污染物并稳定表面质量。研究结果可为开展后处理技术以提高红外激光系统中单晶硅镜的抗激光损伤性能提供参考。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6c38/6480570/1cc38eb2acd3/materials-12-01077-g015.jpg
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本文引用的文献

1
Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process.反应离子刻蚀过程中紫外激光损伤对熔融石英光学元件中污染物浓度的依赖性
Materials (Basel). 2018 Apr 10;11(4):577. doi: 10.3390/ma11040577.
2
Laser absorption precursor research: microstructures in the subsurface of mono-crystalline silicon substrate.激光吸收前驱体研究：单晶硅衬底亚表面的微观结构
Appl Opt. 2017 Oct 20;56(30):8507-8512. doi: 10.1364/AO.56.008507.
3
Multi-petawatt laser facility fully based on optical parametric chirped-pulse amplification.
完全基于光参量啁啾脉冲放大的多拍瓦激光装置
Opt Lett. 2017 May 15;42(10):2014-2017. doi: 10.1364/OL.42.002014.
4
Investigation of surface damage precursor evolutions and laser-induced damage threshold improvement mechanism during Ion beam etching of fused silica.熔石英离子束刻蚀过程中表面损伤前驱体演变及激光诱导损伤阈值提高机制的研究
Opt Express. 2016 Sep 5;24(18):20842-54. doi: 10.1364/OE.24.020842.
5
Research on laser-induced damage resistance of fused silica optics by the fluid jet polishing method.基于流体喷射抛光法的熔石英光学元件抗激光损伤研究
Appl Opt. 2016 Mar 20;55(9):2252-8. doi: 10.1364/AO.55.002252.
6
Reaction ion etching process for improving laser damage resistance of fused silica optical surface.用于提高熔融石英光学表面抗激光损伤性能的反应离子蚀刻工艺。
Opt Express. 2016 Jan 11;24(1):199-211. doi: 10.1364/OE.24.000199.
7
Microscopic morphology evolution during ion beam smoothing of Zerodur® surfaces.
Opt Express. 2014 Jan 13;22(1):377-86. doi: 10.1364/OE.22.000377.
8
Material removal mode affected by the particle size in fluid jet polishing.流体喷射抛光中受颗粒尺寸影响的材料去除模式。
Appl Opt. 2013 Nov 20;52(33):7927-33. doi: 10.1364/AO.52.007927.
9
Intrinsic and roughness-induced absorption of electromagnetic radiation incident on optical surfaces.
Appl Opt. 1982 Apr 15;21(8):1496-501. doi: 10.1364/AO.21.001496.
10
Origin of laser-induced near-subwavelength ripples: interference between surface plasmons and incident laser.激光诱导近亚波长波纹的起源：表面等离激元和入射激光之间的干涉。
ACS Nano. 2009 Dec 22;3(12):4062-70. doi: 10.1021/nn900654v.