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氢与二硫化钼电子能带结构中硫空位诱导的占据缺陷态的相互作用。

Hydrogen interaction with a sulfur-vacancy-induced occupied defect state in the electronic band structure of MoS.

作者信息

Han Sang Wook, Cha Gi-Beom, Kim Kyoo, Hong Soon Cheol

机构信息

Department of Physics and EHSRC, University of Ulsan, Ulsan 44610, Korea.

MPPHC_CPM and Department of Physics, Pohang University of Science and Technology, Pohang 37673, Korea.

出版信息

Phys Chem Chem Phys. 2019 Jul 17;21(28):15302-15309. doi: 10.1039/c9cp01030k.

Abstract

Identifying and designing defects are critical steps in the development of a semiconductor. We unveil that a sufficiently high concentration of the sulfur-vacancy defect on the MoS2 surface induces an occupied defect state in the electronic band structures, in addition to the in-gap defect states. The occupied defect state is expected to appear above and below the valence band maximum (VBM) of the mono- and bilayer or bulk band structures of MoS2, respectively. Furthermore, the hydrogen interaction with the sulfur-vacancy defect reconstructs the band structure of MoS2 to have multi VBMs or ambipolar valence bands depending on the layer thickness. Finally, we find that the polarity switching of MoS2 from n-type to p-type conductivity depends on the type of hydrogen bonds at/around the sulfur-vacancy defect.

摘要

识别和设计缺陷是半导体开发中的关键步骤。我们发现,除了带隙中的缺陷态外,MoS2表面足够高浓度的硫空位缺陷会在电子能带结构中诱导出一个占据的缺陷态。这个占据的缺陷态预计分别出现在单层、双层或体相MoS2能带结构的价带最大值(VBM)之上和之下。此外,氢与硫空位缺陷的相互作用会根据层厚重构MoS2的能带结构,使其具有多个VBM或双极性价带。最后,我们发现MoS2从n型到p型导电性的极性转换取决于硫空位缺陷处/周围氢键的类型。

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