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温度触发的单层 MoS2/石墨烯异质结构中的硫空位演化。

Temperature-Triggered Sulfur Vacancy Evolution in Monolayer MoS /Graphene Heterostructures.

机构信息

Center for Nanochemistry (CNC), Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China.

CAS Key Laboratory of Standardization and Measurement for Nanotechnology, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing, 100190, P. R. China.

出版信息

Small. 2017 Oct;13(40). doi: 10.1002/smll.201602967. Epub 2017 Aug 11.

Abstract

The existence of defects in 2D semiconductors has been predicted to generate unique physical properties and markedly influence their electronic and optoelectronic properties. In this work, it is found that the monolayer MoS prepared by chemical vapor deposition is nearly defect-free after annealing under ultrahigh vacuum conditions at ≈400 K, as evidenced by scanning tunneling microscopy observations. However, after thermal annealing process at ≈900 K, the existence of dominant single sulfur vacancies and relatively rare vacancy chains (2S, 3S, and 4S) is convinced in monolayer MoS as-grown on Au foils. Of particular significance is the revelation that the versatile vacancies can modulate the band structure of the monolayer MoS , leading to a decrease of the bandgap and an obvious n-doping effect. These results are confirmed by scanning tunneling spectroscopy data as well as first-principles theoretical simulations of the related morphologies and the electronic properties of the various defect types. Briefly, this work should pave a novel route for defect engineering and hence the electronic property modulation of three-atom-thin 2D layered semiconductors.

摘要

二维半导体中的缺陷存在被预测会产生独特的物理性质,并显著影响它们的电子和光电性质。在这项工作中,发现在 ≈400 K 的超高真空条件下退火后,通过扫描隧道显微镜观察,化学气相沉积制备的单层 MoS 几乎没有缺陷。然而,在 ≈900 K 的热退火过程后,在单层 MoS 上生长在 Au 箔上,存在主导的单个硫空位和相对较少的空位链(2S、3S 和 4S)。特别重要的是揭示了多功能空位可以调制单层 MoS 的能带结构,导致带隙减小和明显的 n 型掺杂效应。这些结果通过扫描隧道光谱数据以及相关形态和各种缺陷类型的电子性质的第一性原理理论模拟得到证实。简而言之,这项工作应该为缺陷工程以及三原子层二维层状半导体的电子性质调制开辟一条新的途径。

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