Wang Weidong, Bai Liwen, Yang Chenguang, Fan Kangqi, Xie Yong, Li Minglin
School of Mechano-Electronic Engineering, Xidian University, Xi'an 710071, China.
Department of Mechanical Engineering, Northwestern University, Evanston, IL 60208, USA.
Materials (Basel). 2018 Jan 31;11(2):218. doi: 10.3390/ma11020218.
Based on the density functional theory (DFT), the electronic properties of O-doped pure and sulfur vacancy-defect monolayer WS₂ are investigated by using the first-principles method. For the O-doped pure monolayer WS₂, four sizes (2 × 2 × 1, 3 × 3 × 1, 4 × 4 × 1 and 5 × 5 × 1) of supercell are discussed to probe the effects of O doping concentration on the electronic structure. For the 2 × 2 × 1 supercell with 12.5% O doping concentration, the band gap of O-doped pure WS₂ is reduced by 8.9% displaying an indirect band gap. The band gaps in 3 × 3 × 1 and 4 × 4 × 1 supercells are both opened to some extent, respectively, for 5.55% and 3.13% O doping concentrations, while the band gap in 5 × 5 × 1 supercell with 2.0% O doping concentration is quite close to that of the pure monolayer WS₂. Then, two typical point defects, including sulfur single-vacancy (V) and sulfur divacancy (V), are introduced to probe the influences of O doping on the electronic properties of WS₂ monolayers. The observations from DFT calculations show that O doping can broaden the band gap of monolayer WS₂ with V defect to a certain degree, but weaken the band gap of monolayer WS₂ with V defect. Doping O element into either pure or sulfur vacancy-defect monolayer WS₂ cannot change their band gaps significantly, however, it still can be regarded as a potential method to slightly tune the electronic properties of monolayer WS₂.
基于密度泛函理论(DFT),采用第一性原理方法研究了O掺杂的纯单层WS₂和硫空位缺陷单层WS₂的电子性质。对于O掺杂的纯单层WS₂,讨论了四种尺寸(2×2×1、3×3×1、4×4×1和5×5×1)的超胞,以探究O掺杂浓度对电子结构的影响。对于O掺杂浓度为12.5%的2×2×1超胞,O掺杂的纯WS₂的带隙减小了8.9%,呈现出间接带隙。对于O掺杂浓度分别为5.55%和3.13%的3×3×1和4×4×1超胞,带隙都有一定程度的打开,而对于O掺杂浓度为2.0%的5×5×1超胞,其带隙与纯单层WS₂的带隙非常接近。然后,引入了两种典型的点缺陷,包括硫单空位(V)和硫双空位(V),以探究O掺杂对WS₂单层电子性质的影响。DFT计算结果表明,O掺杂可以在一定程度上拓宽具有V缺陷的单层WS₂的带隙,但会削弱具有V缺陷的单层WS₂的带隙。将O元素掺杂到纯的或硫空位缺陷的单层WS₂中均不能显著改变它们的带隙,然而,它仍然可以被视为一种微调单层WS₂电子性质的潜在方法。