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单层半导体中所有非辐射复合途径的电抑制。

Electrical suppression of all nonradiative recombination pathways in monolayer semiconductors.

机构信息

Electrical Engineering and Computer Sciences, University of California, Berkeley, Berkeley, CA 94720, USA.

Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, Berkeley, CA 94720, USA.

出版信息

Science. 2019 May 3;364(6439):468-471. doi: 10.1126/science.aaw8053.

Abstract

Defects in conventional semiconductors substantially lower the photoluminescence (PL) quantum yield (QY), a key metric of optoelectronic performance that directly dictates the maximum device efficiency. Two-dimensional transition-metal dichalcogenides (TMDCs), such as monolayer MoS, often exhibit low PL QY for as-processed samples, which has typically been attributed to a large native defect density. We show that the PL QY of as-processed MoS and WS monolayers reaches near-unity when they are made intrinsic through electrostatic doping, without any chemical passivation. Surprisingly, neutral exciton recombination is entirely radiative even in the presence of a high native defect density. This finding enables TMDC monolayers for optoelectronic device applications as the stringent requirement of low defect density is eased.

摘要

传统半导体中的缺陷会显著降低光致发光(PL)量子产率(QY),这是光电性能的一个关键衡量标准,直接决定了器件的最大效率。二维过渡金属二卤化物(TMDCs),如单层 MoS2,通常表现出低 PLQY 的原始样品,这通常归因于大的本征缺陷密度。我们表明,当通过静电掺杂使 MoS 和 WS 单层本征化时,其 PLQY 达到近 1,而无需任何化学钝化。令人惊讶的是,即使存在高本征缺陷密度,中性激子复合也是完全辐射的。这一发现使 TMDC 单层材料适用于光电设备应用,因为降低缺陷密度的严格要求变得宽松了。

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