Department of Botany, University of Lucknow, Lucknow, 226007, India; Biosphere Impact Studies, Belgian Nuclear Research Center (SCK•CEN), Boeretang 200, Mol, 2400, Belgium.
Biosphere Impact Studies, Belgian Nuclear Research Center (SCK•CEN), Boeretang 200, Mol, 2400, Belgium; Hasselt University, Centre for Environmental Sciences, Agoralaan Building D, 3590, Diepenbeek, Belgium.
Plant Physiol Biochem. 2019 Jul;140:9-17. doi: 10.1016/j.plaphy.2019.04.042. Epub 2019 May 2.
The mutants Atnoa1 and Atnia1nia2noa1-2 having a defective chloroplast developmental process, showed enhanced chlorophyll levels when they were grown on Murashige and Skoog (MS) medium and on exposure with uranium (U) on Hoagland medium. Thus we hypothesized that these mutants probably produced NO in MS medium and on exposure with U. Wild-type Col-0, Atnoa1, Atnia1nia2noa1-2 plants were cultured on modified Hoagland and 1/10 MS media and NO generation in the roots of these mutants was monitored using NO selective fluorescent dyes, DAF-2DA and Fl2E. Both Atnoa1 and Atnia1nia2noa1-2 triple mutants produced NO as observed by increases in DAF-2T and Fl2E fluorescence when these mutants were grown on MS medium but not on Hoagland medium. In presence of NO scavenger, methylene blue (MB, 200 μM), DAF-2T and Fl2E fluorescence was completely abolished. On the other hand treatment of the plants with 25 μM U triggered NO generation. U-treated Atnoa1 and Atnia1nia2noa1-2 plants upregulated genes (POR B, POR D, CHL D) involved in the chlorophyll biosynthesis. From these results it was concluded that Atnoa1 and Atnia1nia2noa1-2 are conditional NO producers and it appears that NO generation in plants substantially depends on growth medium and NIA1, NIA2 or NOA1 does not appear to be really involved in NO generation in MS medium or after U exposure.
具有缺陷叶绿体发育过程的 Atnoa1 和 Atnia1nia2noa1-2 突变体,在 MS 培养基中生长和 Hoagland 培养基中暴露于铀(U)时,表现出增强的叶绿素水平。因此,我们假设这些突变体可能在 MS 培养基中产生了 NO,并且在暴露于 U 时也产生了 NO。野生型 Col-0、Atnoa1、Atnia1nia2noa1-2 植物在改良的 Hoagland 和 1/10 MS 培养基上培养,并使用 NO 选择性荧光染料 DAF-2DA 和 Fl2E 监测这些突变体根部的 NO 生成。当这些突变体在 MS 培养基上生长时,Atnoa1 和 Atnia1nia2noa1-2 三重突变体都产生了 NO,这可以观察到 DAF-2T 和 Fl2E 荧光的增加,但在 Hoagland 培养基上则没有。在存在 NO 清除剂亚甲基蓝(MB,200µM)时,DAF-2T 和 Fl2E 荧光完全被消除。另一方面,用 25µM U 处理植物会引发 NO 的产生。用 U 处理的 Atnoa1 和 Atnia1nia2noa1-2 植物上调了参与叶绿素生物合成的基因(POR B、POR D、CHL D)。从这些结果可以得出结论,Atnoa1 和 Atnia1nia2noa1-2 是条件性的 NO 产生体,似乎植物中 NO 的产生在很大程度上取决于生长培养基,并且 NIA1、NIA2 或 NOA1 似乎并没有真正参与 MS 培养基或 U 暴露后的 NO 产生。