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二苯甲酮类紫外线滤光剂的光毒性风险评估:体外评估和理论模型。

Phototoxic risk assessment on benzophenone UV filters: In vitro assessment and a theoretical model.

机构信息

Cosmetics Safety and Efficacy Evaluation Center, West China Hospital, Sichuan University, No. 5, Gong Xing Road, Chengdu, Sichuan, PR China; Sichuan Engineering Technology Research Center of Cosmetic, Chengdu, Sichuan, PR China.

Department of Dermatology, West China Hospital, Sichuan University, No. 37, Guo Xue Xiang, Chengdu, Sichuan, PR China.

出版信息

Toxicol In Vitro. 2019 Oct;60:180-186. doi: 10.1016/j.tiv.2019.05.021. Epub 2019 May 30.

Abstract

Benzophenones (BPs), filtering out both UVA and UVB rays, are widely used in a great variety of sunscreens and personal care products. However, they have not been extensively studied for the mechanisms of UV-absorbing toxicity. In this study, we used CPZ (chlorpromazine) as a positive control and SDS (sodium dodecyl sulfate) as a negative control, and the phototoxic of BP-1, BP-3 and BP-4 were investigated in vitro assays using three cell types under different UV exposure conditions. This was followed by setting up a theoretical model, which was adopted to predict and compare the phototoxicity. It was found that Balb/c 3T3 (Balb/c 3T3 fibroblast cell lines) showed sensitivity to UVA+ and UVB+ exposure, while the HS68 (human HS68 fibroblast cell lines) to UVA+ and the HaCaT (human HaCaT keratinocyte cell lines) to UVB+. The test compound, BP-1, was detected to be phototoxic at UVA+ conditions, but BP-3 and BP-4 were discovered to be non-phototoxic at UVA+ conditions. This demonstrated that BP-1, BP-3 and BP-4 remained low-risk chemicals under UVB+ condition. The theoretical calculation of the energy gap (E) showed BP-1(E) > BP-3(E) > BP-4(E).

摘要

苯并二酮(BPs)可以同时过滤 UVA 和 UVB 射线,被广泛应用于各种防晒霜和个人护理产品中。然而,它们的紫外线吸收毒性机制尚未得到广泛研究。在本研究中,我们使用氯丙嗪(CPZ)作为阳性对照,十二烷基硫酸钠(SDS)作为阴性对照,在不同的紫外线照射条件下,使用三种细胞类型在体外试验中研究了 BP-1、BP-3 和 BP-4 的光毒性。随后建立了一个理论模型,用于预测和比较光毒性。结果发现,Balb/c 3T3(Balb/c 3T3 成纤维细胞系)对 UVA+和 UVB+暴露敏感,而 HS68(人 HS68 成纤维细胞系)对 UVA+和 HaCaT(人 HaCaT 角质形成细胞系)对 UVB+敏感。测试化合物 BP-1 在 UVA+条件下被检测到具有光毒性,而 BP-3 和 BP-4 在 UVA+条件下被发现是非光毒性的。这表明 BP-1、BP-3 和 BP-4 在 UVB+条件下仍然是低风险化学品。能量间隙(E)的理论计算表明 BP-1(E)>BP-3(E)>BP-4(E)。

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