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少层到多层二硫化锗:合成、结构、稳定性及光电子学

Few-Layer to Multilayer Germanium(II) Sulfide: Synthesis, Structure, Stability, and Optoelectronics.

作者信息

Sutter Eli, Zhang Bo, Sun Muhua, Sutter Peter

机构信息

Department of Mechanical and Materials Engineering , University of Nebraska-Lincoln , Lincoln , Nebraska 68588 , United States.

Department of Electrical and Computer Engineering , University of Nebraska-Lincoln , Lincoln , Nebraska 68588 , United States.

出版信息

ACS Nano. 2019 Aug 27;13(8):9352-9362. doi: 10.1021/acsnano.9b03986. Epub 2019 Jul 19.

Abstract

Among 2D/layered semiconductors, group IV monochalcogenides such as SnS(e) and GeS(e) have attracted attention as phosphorene/black phosphorus analogues with anisotropic structures and predicted unusual properties. In contrast to SnS, for which bottom-up synthesis has been reported, few-layer GeS has been realized primarily exfoliation from bulk crystals. Here, we report the synthesis of large (up to >20 μm), faceted single crystalline GeS flakes with anisotropic properties using a vapor transport process. electron microscopy is used to identify the thermal stability and sublimation pathways, and demonstrates that the GeS flakes are self-encapsulated in a thin, sulfur-rich amorphous GeS shell during growth. The shell provides exceptional chemical stability to the layered GeS core. In contrast to exfoliated GeS, which rapidly degrades during exposure to air, the synthesized GeS-GeS core-shell structures show no signs of chemical attack and remain unchanged in air for extended time periods. Measurements of the optoelectronic properties by photoluminescence spectroscopy show a tunable bandgap due to out-of-plane quantum confinement in flakes with thickness below 100 nm. Cathodoluminescence (CL) spectroscopy with nanoscale excitation provides evidence for interfacial charge transfer due to a type II heterojunction between the crystalline core and amorphous shell. Measurements by locally excited CL yield a minority carrier (electron) diffusion length in the -type GeS core = 0.27 μm, on par with diffusion lengths in the highest-quality layered chalcogenide semiconductors.

摘要

在二维/层状半导体中,IV族单硫属化物,如SnS(e)和GeS(e),作为具有各向异性结构且具有预测的异常性质的磷烯/黑磷类似物,已引起关注。与已报道有自下而上合成方法的SnS不同,少层GeS主要是通过从块状晶体剥离来实现的。在此,我们报道了使用气相输运过程合成具有各向异性性质的大尺寸(高达>20μm)、多面单晶GeS薄片。电子显微镜用于确定热稳定性和升华途径,并证明GeS薄片在生长过程中被自包裹在一层薄的、富含硫的非晶GeS壳中。该壳为层状GeS核提供了出色的化学稳定性。与在暴露于空气时会迅速降解的剥离GeS不同,合成的GeS-GeS核壳结构没有化学侵蚀的迹象,并且在空气中长时间保持不变。通过光致发光光谱对光电性质的测量表明,由于厚度低于100nm的薄片中的面外量子限制,带隙是可调的。具有纳米级激发的阴极发光(CL)光谱为晶体核与非晶壳之间的II型异质结导致的界面电荷转移提供了证据。通过局部激发CL测量得到在n型GeS核中的少数载流子(电子)扩散长度 = 0.27μm,与最高质量的层状硫属化物半导体中的扩散长度相当。

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