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在亚20纳米的高聚物电介质上自发形成分子级薄的疏水表层,用于实现极其稳定的有机薄膜晶体管操作。

Spontaneous Generation of a Molecular Thin Hydrophobic Skin Layer on a Sub-20 nm, High- Polymer Dielectric for Extremely Stable Organic Thin-Film Transistor Operation.

作者信息

Choi Junhwan, Yoon Jongsun, Kim Min Ju, Pak Kwanyong, Lee Changhyeon, Lee Haechang, Jeong Kihoon, Ihm Kyuwook, Yoo Seunghyup, Cho Byung Jin, Lee Hyomin, Im Sung Gap

机构信息

Department of Chemical and Biomolecular Engineering and KI for NanoCentury , Korea Advanced Institute of Science and Technology (KAIST) , 291 Daehak-ro , Yuseong-gu, Daejeon 34141 , Republic of Korea.

Department of Chemical Engineering , Pohang University of Science and Technology (POSTECH) , 77 Cheongam-ro , Nam-gu, Pohang , Gyeongbuk 37673 , Republic of Korea.

出版信息

ACS Appl Mater Interfaces. 2019 Aug 14;11(32):29113-29123. doi: 10.1021/acsami.9b09891. Epub 2019 Aug 5.

Abstract

Polymer dielectric materials with hydroxyl functionalities such as poly(4-vinylphenol) and poly(vinyl alcohol) have been utilized widely in organic thin-film transistors (OTFTs) because of their excellent insulating performance gained by hydroxyl-mediated cross-linking. However, the polar hydroxyl functionality also deleteriously affects the performance of OTFTs and significantly impairs the device stability. In this study, a sub-20 nm, high- copolymer dielectric with hydroxyl functionality, poly(2-hydroxyethyl acrylate--di(ethylene glycol) divinyl ether), was synthesized in the vapor phase via initiated chemical vapor deposition. The inherently dry environment offered by the vapor-phase polymer synthesis prompted the snuggling of polar hydroxyl functionalities into the bulk polymer film to form a molecular thin hydrophobic skin layer at its surface, verified by near-edge X-ray absorption fine structure analysis. The chemical composition of the copolymer dielectric was optimized systematically to achieve high dielectric constant ( ≈ 6.2) as well as extremely low leakage current densities (less than 3 × 10 A/cm in the range of ±2 MV/cm) even with sub-20 nm thickness, leading to one of the highest capacitance (higher than 300 nF/cm) achieved by a single polymer dielectric to date. Exploiting the structural advantage of the cross-linked high- polymer dielectric, high-performance OTFTs were obtained. Notably, the spontaneously formed molecular thin, hydrophobic skin layer in the copolymer film substantially suppressed the hysteresis in the transistor operation. The trap analysis also suggested the formation of bulk trap with a high energy barrier and sufficiently low trap densities at the semiconductor/dielectric interface, owing to the surface skin layer. Furthermore, the OTFTs with the -OH-containing copolymer dielectric showed an unprecedentedly excellent operational stability. No apparent OTFT degradation was observed up to 50 000 s of high constant voltage stress (corresponding to the applied electric field of 1.4 MV/cm) because of the markedly suppressed interfacial trap density by the hydrophobic skin layer, together with the current compensation by the bulk hydroxyl functionalities. We believe that the surface modification-free, one-step polymer dielectric synthetic strategy will provide a new insight into the design of polymer dielectric materials for high-performance, low-power soft electronic devices with high operational stability.

摘要

具有羟基官能团的聚合物介电材料,如聚(4-乙烯基苯酚)和聚乙烯醇,由于通过羟基介导的交联获得了优异的绝缘性能,已被广泛应用于有机薄膜晶体管(OTFT)中。然而,极性羟基官能团也会对OTFT的性能产生不利影响,并显著损害器件稳定性。在本研究中,通过引发化学气相沉积在气相中合成了一种亚20 nm、具有羟基官能团的高聚物介电材料聚(丙烯酸2-羟乙酯-二(乙二醇)二乙烯基醚)。气相聚合物合成提供的固有干燥环境促使极性羟基官能团紧密排列在本体聚合物薄膜中,在其表面形成分子薄的疏水表皮层,这通过近边X射线吸收精细结构分析得到证实。系统地优化了共聚物介电材料的化学成分,以实现高介电常数(≈6.2)以及即使在亚20 nm厚度下也极低的漏电流密度(在±2 MV/cm范围内小于3×10 A/cm),从而得到了迄今为止由单一聚合物介电材料实现的最高电容之一(高于300 nF/cm)。利用交联高聚物介电材料的结构优势,获得了高性能的OTFT。值得注意的是,共聚物薄膜中自发形成的分子薄疏水表皮层极大地抑制了晶体管操作中的滞后现象。陷阱分析还表明,由于表面表皮层的存在,在半导体/介电界面形成了具有高能量势垒和足够低陷阱密度的本体陷阱。此外,具有含羟基共聚物介电材料的OTFT表现出前所未有的优异操作稳定性。由于疏水表皮层显著抑制了界面陷阱密度,以及本体羟基官能团的电流补偿作用,在高达50000 s的高恒定电压应力(对应于1.4 MV/cm的施加电场)下未观察到明显的OTFT性能退化。我们相信,这种无需表面改性的一步法聚合物介电合成策略将为高性能、低功耗且具有高操作稳定性的软电子器件的聚合物介电材料设计提供新的思路。

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