Vasimalla Suresh, Subbarao Nimmakayala V V, Gedda Murali, Goswami Dipak K, Iyer Parameswar Krishnan
Department of Chemistry, Centre for Nanotechnology, and Department of Physics, Indian Institute of Technology Guwahati, 781039 Guwahati, Assam, India.
ACS Omega. 2017 Jun 7;2(6):2552-2560. doi: 10.1021/acsomega.7b00374. eCollection 2017 Jun 30.
It is well-known that the improvement in the performance of organic field-effect transistors (OFETs) relies primarily on growth properties of organic molecules on gate dielectrics, their interface behavior, and on understanding the physical processes occurring during device operation. In this work, the relation of varying the dielectric materials in an n-type OFET device based on 1,7-dibromo-,'-dioctadecyl-3,4,9,10-perylenetetracarboxylic diimide (BrPTCDI-C18) molecule on a low-cost glass substrate at different channel lengths is reported, which is conceptually very important and fundamental in the context of device performance. Anodized alumina (AlO) along with dielectric films of polyvinyl alcohol (PVA) or polymethylmethacrylate (PMMA) was used to fabricate the devices and study their influence on various transistor properties. In addition, the effects of a thin hexamethyldisilazane (HMDS) layer on the performance of OFETs including their contact resistances were studied with the channel length variations. The devices with PVA dielectric material exhibited the maximum mobility values of 0.012-0.025 cm V s irrespective of varying channel lengths from 25 to 190 μm. The bias-stress measurements were recorded to realize the effects of the channel length and HMDS layer on the stability of the devices. The on/off ratios and electrical stabilities of these devices were enhanced significantly by modifying the surface of the PVA dielectric layer using a thin layer of HMDS. Similarly, in the case of PMMA dielectric layer, a drastic enhancement in the on/off ratio and bias-stress stability was observed. Characterization of all devices at different channel lengths using different dielectric materials permitted us to identify the effects of contact resistance on OFET devices. The stability of the devices in relation to the bias-stress measurements of devices by varying channel lengths and surface modification was systematically investigated. A careful analysis of oxide gate dielectrics modified with polymer-based dielectric materials, contact resistance, influence of thin HMDS layer on the electrical properties, and other parameters on top-contact bottom-gated configured n-type OFET devices is presented herein.
众所周知,有机场效应晶体管(OFET)性能的提升主要依赖于有机分子在栅极电介质上的生长特性、它们的界面行为,以及对器件运行过程中发生的物理过程的理解。在这项工作中,报告了在低成本玻璃基板上,基于1,7 - 二溴 - ,'- 二辛基 - 3,4,9,10 - 苝四羧酸二酰亚胺(BrPTCDI - C18)分子的n型OFET器件中,不同沟道长度下改变介电材料之间的关系,这在器件性能方面具有非常重要的概念性和基础性意义。采用阳极氧化铝(AlO)以及聚乙烯醇(PVA)或聚甲基丙烯酸甲酯(PMMA)介电膜来制造器件,并研究它们对各种晶体管特性的影响。此外,还研究了薄六甲基二硅氮烷(HMDS)层对OFET性能(包括其接触电阻)随沟道长度变化的影响。具有PVA介电材料的器件,无论沟道长度在25至190μm之间如何变化,都表现出0.012 - 0.025 cm² V⁻¹ s⁻¹的最大迁移率值。记录了偏置应力测量结果,以了解沟道长度和HMDS层对器件稳定性的影响。通过使用薄HMDS层修饰PVA介电层表面,这些器件的开/关比和电稳定性得到了显著提高。同样,在PMMA介电层的情况下,观察到开/关比和偏置应力稳定性有大幅提高。使用不同介电材料对不同沟道长度的所有器件进行表征,使我们能够确定接触电阻对OFET器件的影响。系统地研究了器件在通过改变沟道长度和表面改性进行偏置应力测量时的稳定性。本文对基于聚合物的介电材料改性的氧化物栅极电介质、接触电阻、薄HMDS层对电学性能的影响以及顶接触底栅配置的n型OFET器件的其他参数进行了仔细分析。