King Abdullah Institute for Nanotechnology, King Saud University, Riyadh 11142, Saudi Arabia.
Department of Physics and Astronomy, College of Science, King Saud University, Riyadh 11142, Saudi Arabia.
Int J Environ Res Public Health. 2019 Sep 1;16(17):3199. doi: 10.3390/ijerph16173199.
Widespread application of silica nanoparticles (nSiO) and ubiquitous metalloid arsenic (As) may increase their chances of co-exposure to human beings in daily life. Nonetheless, studies on combined effects of nSiO and As in human cells are lacking. We investigated the co-exposure effects of nSiO and As in human liver (HepG2) and human fibroblast (HT1080) cells. Results showed that nSiO did not cause cytotoxicity. However, exposure of As caused oxidative stress and apoptosis in both types of cells. Interesting results were that co-exposure of a non-cytotoxic concentration of nSiO significantly augmented the As induced toxicity in both cells. Intracellular level of As was higher in the co-exposure group (nSiO + As) than the As group alone, suggesting that nSiO facilitates the cellular uptake of As. Co-exposure of nSiO and As potentiated oxidative stress indicated by pro-oxidants generation (reactive oxygen species, hydrogen peroxide and lipid peroxidation) and antioxidants depletion (glutathione level, and glutathione reductase, superoxide dismutase and catalase activities). In addition, co-exposure of nSiO and As also potentiated mitochondria-mediated apoptosis suggested by increased expression of , , and genes (pro-apoptotic) and decreased expression of gene (anti-apoptotic) along with depleted mitochondrial membrane potential. To the best of our knowledge, this is the first study showing that co-exposure of nSiO and As induced augmentation of oxidative stress and mitochondria-mediated apoptosis in HepG2 and HT1080 cells. Hence, careful attention is required for human health assessment following combined exposure to nSiO and As.
广泛应用的纳米二氧化硅(nSiO)和无处不在的类金属砷(As)可能会增加它们在日常生活中与人共同暴露的机会。尽管如此,关于 nSiO 和 As 联合作用对人类细胞影响的研究还很缺乏。我们研究了 nSiO 和 As 在人肝(HepG2)和人成纤维(HT1080)细胞中的共同暴露效应。结果表明,nSiO 没有引起细胞毒性。然而,As 的暴露导致两种细胞的氧化应激和细胞凋亡。有趣的结果是,nSiO 的非细胞毒性浓度的共同暴露显著增强了两种细胞中 As 诱导的毒性。在共同暴露组(nSiO+As)中细胞内的 As 水平高于单独 As 组,这表明 nSiO 促进了 As 的细胞摄取。nSiO 和 As 的共同暴露增强了氧化应激,表现为产生活性氧(ROS)、过氧化氢和脂质过氧化)和抗氧化剂耗竭(谷胱甘肽水平和谷胱甘肽还原酶、超氧化物歧化酶和过氧化氢酶活性)。此外,nSiO 和 As 的共同暴露也增强了线粒体介导的凋亡,表现为促凋亡基因( 、 、 和 )表达增加和抗凋亡基因( )表达减少,同时线粒体膜电位耗竭。据我们所知,这是第一项表明 nSiO 和 As 共同暴露在 HepG2 和 HT1080 细胞中引起氧化应激和线粒体介导的凋亡增强的研究。因此,在评估人类健康时需要对 nSiO 和 As 的联合暴露给予充分关注。
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