Hefei National Laboratory for Physical Sciences at Microscale, Department of Chemical Physics, and Synergetic Innovation Center of Quantum Information and Quantum Physics, University of Science and Technology of China, Hefei, Anhui 230026, China.
Phys Chem Chem Phys. 2019 Nov 14;21(42):23611-23619. doi: 10.1039/c9cp04654b. Epub 2019 Oct 18.
We systematically investigate the effects of external electric field and interlayer coupling on the electronic structures and contact characteristics of hybrid graphene and tellurene (G/Te) van der Waals heterostructures (vdWHs) based on first-principles calculations. Our results show that the G/α-Te interface is formed by an n-type Schottky contact with a negligible Schottky barrier height (SBH), while the G/β-Te interface is formed by a p-type Schottky contact with a SBH of 0.51 eV. By applying external electric fields perpendicular to the G/Te interfaces or changing the interlayer distance between the graphene and tellurene monolayers, both Schottky barriers and contact types (n-type Schottky, p-type Schottky, and Ohmic) at the G/Te interfaces can be effectively modulated. The changes in charge transfer, as well as the corresponding interface dipole and potential step with the external electric field and interlayer coupling, are revealed to account for the reason for tunable Schottky and Ohmic contacts at the G/Te interfaces. Therefore, the G/Te vdWHs show tunable Schottky and Ohmic contacts with promising applications of graphene-based field-effect transistors in future experiments.
我们基于第一性原理计算系统地研究了外电场和层间耦合对杂交石墨烯和碲烯(G/Te)范德华异质结构(vdWHs)电子结构和接触特性的影响。研究结果表明,G/α-Te 界面形成了具有可忽略肖特基势垒高度(SBH)的 n 型肖特基接触,而 G/β-Te 界面形成了具有 0.51eV 的 SBH 的 p 型肖特基接触。通过施加垂直于 G/Te 界面的外电场或改变石墨烯和碲烯单层之间的层间距离,可以有效地调节 G/Te 界面的肖特基势垒和接触类型(n 型肖特基、p 型肖特基和欧姆接触)。电荷转移的变化,以及相应的界面偶极子和与外电场和层间耦合相关的势阶,被揭示为 G/Te 界面可调谐肖特基和欧姆接触的原因。因此,G/Te vdWHs 表现出可调谐的肖特基和欧姆接触,这为未来实验中基于石墨烯的场效应晶体管的应用提供了广阔的前景。