Peng Lei, Cui Yu, Sun Liping, Du Jinyan, Wang Sufan, Zhang Shengli, Huang Yucheng
College of Chemistry and Material Science, The Key Laboratory of Functional Molecular Solids, Ministry of Education, Anhui Laboratory of Molecule-Based Materials, Anhui Normal University, Wuhu 241000, China.
Nanoscale Horiz. 2019 Mar 1;4(2):480-489. doi: 10.1039/c8nh00413g. Epub 2018 Nov 26.
Controlling the interface structure is of utmost importance to regulating the nanoscale Schottky barrier height (SBH). Herein, by using first-principles calculations, the electronic properties of the graphene (G) based blue-phosphorene-phase of GeSe van der Waals (vdW) heterostructures, including M/G and X/G interfaces (M = Ge; X = Se), are systematically investigated. When the layer spacing exceeds the vdW gap, n-type Schottky contacts are formed for both MX/G and XM/G heterojunctions. With the layer spacing decreasing to equilibrium distances, due to different charge transfer across the interface, MX/G and XM/G heterojunctions display n- and p-type Schottky contacts, respectively. Further decreasing the layer distance makes both heterojunctions transit into p-type ones. The layer-spacing-dependent SBHs can be rationalized by the increased charge transfer across the interface and the resulting interfacial dipole enhancement. Enlightened by the finding of dipole-controlled SBHs, using MX as building blocks, two different stacking patterns, i.e., nMX-MX-G and nXM-XM-G (n = 1 and 2), are designed to further modulate the SBH. Interestingly, due to the presence of the intrinsic dipole of MX, it is found that the magnitude and orientation of the interfacial dipole can be artificially engineered. With n increasing from 0 to 2, nMX-MX-G with an X/G interface changes from the n-type Schottky contact to Ohmic contact. The Fermi level meets the conduction band and G shows a p-type doping feature finally. Likewise, transition from p-type Schottky contact to Ohmic contact is observed for the nXM-XM-G with M/G interface, accompanied by the Fermi level touching the valence band and the feature of n-type doping for G. The role of nMX stacking seems like the role of applying an external electric field (E-field): applying positive E-field is equivalent to the increase of dipole moment while negative E-field corresponds to the offset of dipole moment. In brief, the SBHs of GeSe/G contact are found to be tunable which originates from the intrinsic dipole of MX. The predictable SBHs for these kinds of charming built-in dipole systems are expected to be highly desirable in electronic devices.
控制界面结构对于调节纳米级肖特基势垒高度(SBH)至关重要。在此,通过第一性原理计算,系统地研究了基于石墨烯(G)的锗硒范德华(vdW)异质结构的蓝磷烯相的电子性质,包括M/G和X/G界面(M = Ge;X = Se)。当层间距超过vdW间隙时,MX/G和XM/G异质结均形成n型肖特基接触。随着层间距减小至平衡距离,由于界面上不同的电荷转移,MX/G和XM/G异质结分别显示n型和p型肖特基接触。进一步减小层间距会使两个异质结都转变为p型。层间距依赖的SBH可以通过界面上电荷转移的增加以及由此产生的界面偶极增强来合理解释。受偶极控制的SBH这一发现的启发,以MX为构建块,设计了两种不同的堆叠模式,即nMX-MX-G和nXM-XM-G(n = 1和2),以进一步调节SBH。有趣的是,由于MX存在固有偶极,发现界面偶极的大小和方向可以人为设计。随着n从0增加到2,具有X/G界面的nMX-MX-G从n型肖特基接触变为欧姆接触。费米能级与导带相遇,G最终呈现p型掺杂特征。同样,对于具有M/G界面的nXM-XM-G,观察到从p型肖特基接触到欧姆接触的转变,同时费米能级接触价带,G呈现n型掺杂特征。nMX堆叠的作用类似于施加外部电场(E场)的作用:施加正E场相当于偶极矩的增加,而负E场对应于偶极矩的抵消。简而言之,发现锗硒/G接触的SBH是可调的,这源于MX的固有偶极。对于这些迷人的内置偶极系统,可预测的SBH有望在电子器件中非常受欢迎。