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TiNF/α-Te范德华异质结构中的可调肖特基和欧姆接触。

Tunable Schottky and ohmic contacts in the TiNF/α-Te van der Waals heterostructure.

作者信息

Jiang Jingwen, Xu Yiguo, Zhang Xiuwen

机构信息

Shenzhen Key Laboratory of Flexible Memory Materials and Devices, College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen, 518060, China.

Academy for Advanced Interdisciplinary Studies, Southern University of Science and Technology, Shenzhen, 518055, China.

出版信息

Phys Chem Chem Phys. 2022 Sep 14;24(35):21388-21395. doi: 10.1039/d2cp02054h.

Abstract

Two dimensional α-Te holds great promise in optoelectronic devices because of its high mobility and excellent environmental stability. In this study, the electronic structures and interfacial contact characteristics of the TiNF/α-Te van der Waals heterostructure are investigated by means of first-principles calculations. It is found that p-type Schottky contacts with a Schottky barrier (SB) of 0.21 eV are formed at the TiNF/α-Te interface. By applying external electric fields or controlling the interlayer coupling between the TiNF and α-Te monolayers, the SB height can be effectively tuned, and all the n-type Schottky, p-type Schottky, n-type ohmic and p-type ohmic contacts can be achieved. Such an extremely high tunability is further found to be closely associated with the charge transfer at the interface, as well as the interface dipole and the potential step. Our results provide an avenue for the design of future α-Te-based electronic devices with high performance.

摘要

二维α-Te由于其高迁移率和出色的环境稳定性,在光电器件中具有巨大潜力。在本研究中,通过第一性原理计算研究了TiNF/α-Te范德华异质结构的电子结构和界面接触特性。研究发现,在TiNF/α-Te界面形成了肖特基势垒(SB)为0.21 eV的p型肖特基接触。通过施加外部电场或控制TiNF和α-Te单层之间的层间耦合,可以有效地调节SB高度,并且可以实现所有的n型肖特基、p型肖特基、n型欧姆和p型欧姆接触。进一步发现,这种极高的可调性与界面处的电荷转移以及界面偶极和势垒密切相关。我们的结果为未来高性能α-Te基电子器件的设计提供了一条途径。

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