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在拟南芥中,叶绿体运动、非光化学猝灭和电子传递速率对于光驯化和高光耐受的重要性。

The importance of chloroplast movement, nonphotochemical quenching, and electron transport rates in light acclimation and tolerance to high light in Arabidopsis thaliana.

机构信息

Department of Biological Sciences, Wellesley College, Wellesley, MA, 02481, USA.

Plant Biology Section, School of Integrative Plant Science, Cornell University, Ithaca, NY, 14853, USA.

出版信息

Am J Bot. 2019 Nov;106(11):1444-1453. doi: 10.1002/ajb2.1378. Epub 2019 Oct 24.

DOI:10.1002/ajb2.1378
PMID:31647579
Abstract

PREMISE

While essential for photosynthesis, excess light can damage plants. We investigated how growth light conditions affect two photoprotective strategies, chloroplast movement and nonphotochemical quenching (NPQ), as well as electron transport rates (ETR), and the relative importance of these processes in the short-term stress tolerance of Arabidopsis thaliana.

METHODS

We grew wild-type (WT) and mutant plants with impaired chloroplast movement (phot1, phot2, phot1 phot2, chup1) or NPQ (npq1) at low (160 μmol photons m s ) or intermediate light (400 μmol photons m s ) before quantifying transmission changes due to chloroplast movement, NPQ, ETR, and the ability to recover from a short-term high-light treatment.

RESULTS

Plants with impaired chloroplast avoidance movement (phot2, phot1 phot2, chup1) did not recover as well from a short-term high light treatment as the WT or npq1 and phot1 mutants. Plants grown at intermediate light recovered more completely from the same stress treatment regardless of their genotype and despite reduced degrees of transmission changes due to chloroplast movement. This result was due in part to all genotypes having up to a 2-fold increase in ETR and a slight increase in NPQ .

CONCLUSIONS

Growth light conditions affect which mechanisms are important in dealing with short-term high-light stress. The chloroplast avoidance response is important for low-light-grown plants, while increases in ETR and NPQ allow plants grown at intermediate light intensities to avoid being damaged.

摘要

前提

尽管对光合作用至关重要,但过量的光会损害植物。我们研究了生长光条件如何影响两种光保护策略,即叶绿体运动和非光化学猝灭(NPQ),以及电子传递速率(ETR),以及这些过程在拟南芥短期胁迫耐受中的相对重要性。

方法

我们在低光(160 μmol 光子 m s)或中光(400 μmol 光子 m s)下生长野生型(WT)和突变体植物,这些突变体植物的叶绿体运动(phot1、phot2、phot1 phot2、chup1)或 NPQ(npq1)受损,然后量化由于叶绿体运动、NPQ、ETR 以及从短期高光处理中恢复的能力而导致的透射变化。

结果

与 WT 或 npq1 和 phot1 突变体相比,叶绿体回避运动受损的植物(phot2、phot1 phot2、chup1)从短期高光处理中恢复得较差。无论其基因型如何,在中间光下生长的植物都能更完全地从相同的胁迫处理中恢复,尽管由于叶绿体运动导致的透射变化程度降低。这一结果部分是由于所有基因型的 ETR 增加了 2 倍,NPQ 略有增加。

结论

生长光条件会影响处理短期高光胁迫时哪些机制是重要的。叶绿体回避反应对低光生长的植物很重要,而 ETR 和 NPQ 的增加使在中光强度下生长的植物能够避免受损。

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