Liang Jierui, Xu Ke, Wu Maokun, Hunt Benjamin M, Wang Wei-Hua, Cho Kyeongjae, Fullerton-Shirey Susan K
Department of Chemical and Petroleum Engineering , University of Pittsburgh , Pittsburgh , Pennsylvania 15260 , United States.
Department of Electronic Science and Engineering and Tianjin Key Laboratory of Photo-Electronic Thin Film Device and Technology , Nankai University , Tianjin 300071 , P.R. China.
Nano Lett. 2019 Dec 11;19(12):8911-8919. doi: 10.1021/acs.nanolett.9b03792. Epub 2019 Nov 11.
A molecularly thin electrolyte is developed to demonstrate a nonvolatile, solid-state, one-transistor (1T) memory based on an electric-double-layer (EDL) gated WSe field-effect transistor (FET). The custom-designed monolayer electrolyte consists of cobalt crown ether phthalocyanine and lithium ions, which are positioned by field-effect at either the surface of the WSe channel or an h-BN capping layer to achieve "1" or "0", respectively. Bistability in the monolayer electrolyte memory is significantly improved by the h-BN cap with density functional theory (DFT) calculations showing enhanced trapping of Li near h-BN due to a ∼1.34 eV increase in the absolute value of the adsorption energy compared to vacuum. The threshold voltage shift between the two states corresponds to a change in charge density of ∼2.5 × 10 cm, and an On/Off ratio exceeding 10 at a back gate voltage of 0 V. The On/Off ratio remains stable after 1000 cycles and the retention time for each state exceeds 6 h (max measured). When the write time approaches 1 ms, the On/Off ratio remains >10, showing that the monolayer electrolyte-gated FET can respond on time scales similar to existing flash memory. The data suggest that faster switching times and lower switching voltages could be feasible by top gating.
开发了一种分子级薄的电解质,以展示一种基于双电层(EDL)栅控WSe场效应晶体管(FET)的非易失性固态单晶体管(1T)存储器。定制设计的单层电解质由钴冠醚酞菁和锂离子组成,它们通过场效应分别位于WSe沟道表面或h-BN覆盖层上,以分别实现“1”或“0”。通过h-BN覆盖层,单层电解质存储器的双稳性得到显著改善,密度泛函理论(DFT)计算表明,与真空相比,由于吸附能绝对值增加约1.34 eV,Li在h-BN附近的俘获增强。两种状态之间的阈值电压偏移对应于电荷密度变化约2.5×10 cm,在背栅电压为0 V时开/关比超过10。经过1000次循环后,开/关比保持稳定,每种状态的保持时间超过6小时(最大测量值)。当写入时间接近1 ms时开/关比保持>10,表明单层电解质栅控FET能够在与现有闪存类似的时间尺度上做出响应。数据表明,通过顶部栅控实现更快的开关时间和更低的开关电压是可行的。