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用于全固态非易失性二维晶体存储器的分子级超薄电解质

Molecularly Thin Electrolyte for All Solid-State Nonvolatile Two-Dimensional Crystal Memory.

作者信息

Liang Jierui, Xu Ke, Wu Maokun, Hunt Benjamin M, Wang Wei-Hua, Cho Kyeongjae, Fullerton-Shirey Susan K

机构信息

Department of Chemical and Petroleum Engineering , University of Pittsburgh , Pittsburgh , Pennsylvania 15260 , United States.

Department of Electronic Science and Engineering and Tianjin Key Laboratory of Photo-Electronic Thin Film Device and Technology , Nankai University , Tianjin 300071 , P.R. China.

出版信息

Nano Lett. 2019 Dec 11;19(12):8911-8919. doi: 10.1021/acs.nanolett.9b03792. Epub 2019 Nov 11.

Abstract

A molecularly thin electrolyte is developed to demonstrate a nonvolatile, solid-state, one-transistor (1T) memory based on an electric-double-layer (EDL) gated WSe field-effect transistor (FET). The custom-designed monolayer electrolyte consists of cobalt crown ether phthalocyanine and lithium ions, which are positioned by field-effect at either the surface of the WSe channel or an h-BN capping layer to achieve "1" or "0", respectively. Bistability in the monolayer electrolyte memory is significantly improved by the h-BN cap with density functional theory (DFT) calculations showing enhanced trapping of Li near h-BN due to a ∼1.34 eV increase in the absolute value of the adsorption energy compared to vacuum. The threshold voltage shift between the two states corresponds to a change in charge density of ∼2.5 × 10 cm, and an On/Off ratio exceeding 10 at a back gate voltage of 0 V. The On/Off ratio remains stable after 1000 cycles and the retention time for each state exceeds 6 h (max measured). When the write time approaches 1 ms, the On/Off ratio remains >10, showing that the monolayer electrolyte-gated FET can respond on time scales similar to existing flash memory. The data suggest that faster switching times and lower switching voltages could be feasible by top gating.

摘要

开发了一种分子级薄的电解质,以展示一种基于双电层(EDL)栅控WSe场效应晶体管(FET)的非易失性固态单晶体管(1T)存储器。定制设计的单层电解质由钴冠醚酞菁和锂离子组成,它们通过场效应分别位于WSe沟道表面或h-BN覆盖层上,以分别实现“1”或“0”。通过h-BN覆盖层,单层电解质存储器的双稳性得到显著改善,密度泛函理论(DFT)计算表明,与真空相比,由于吸附能绝对值增加约1.34 eV,Li在h-BN附近的俘获增强。两种状态之间的阈值电压偏移对应于电荷密度变化约2.5×10 cm,在背栅电压为0 V时开/关比超过10。经过1000次循环后,开/关比保持稳定,每种状态的保持时间超过6小时(最大测量值)。当写入时间接近1 ms时开/关比保持>10,表明单层电解质栅控FET能够在与现有闪存类似的时间尺度上做出响应。数据表明,通过顶部栅控实现更快的开关时间和更低的开关电压是可行的。

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