Liu Taili, Foo Yishu, Zapien Juan Antonio, Li Menglin, Tsang Sai-Wing
Department of Materials Science and Engineering, City University of Hong Kong, 83 Tat Chee Ave, Kowloon Tong, Hong Kong SAR, P. R. China.
Center of Super-Diamond and Advanced Films (COSDAF), City University of Hong Kong, 83 Tat Chee Ave, Kowloon Tong, Hong Kong SAR, P. R. China.
Nat Commun. 2019 Nov 8;10(1):5089. doi: 10.1038/s41467-019-13081-w.
Electromodulation (EM) spectroscopy, a powerful technique to monitor the changes in polarizability p and dipole moment u of materials upon photo-excitation, can bring direct insight into the excitonic properties of materials. However, extracting Δp and Δu from the electromodulation spectrum relies on fitting with optical absorption of the materials where optical effect in different device geometries might introduce large variation in the extracted values. Here, we demonstrate a systematic electromodulation study with various fitting approaches in both commonly adopted reflection and transmission device architectures. Strikingly, we have found that the previously ascribed continuum state threshold from the deviation between the measured and fitting results is questionable. Such deviation is found to be caused by the overlooked optical interference and electrorefraction effect. A generalized electromodulation model is proposed to incorporate the two effects, and the extracted Δp and Δu have excellent consistency in both reflection and transmission modes in all organic film thicknesses.
电调制(EM)光谱是一种监测光激发时材料极化率 p 和偶极矩 u 变化的强大技术,它可以直接洞察材料的激子特性。然而,从电调制光谱中提取 Δp 和 Δu 依赖于与材料的光吸收进行拟合,而不同器件几何结构中的光学效应可能会使提取值产生很大变化。在此,我们展示了在常用的反射和透射器件结构中采用各种拟合方法进行的系统电调制研究。令人惊讶的是,我们发现之前从测量结果与拟合结果的偏差中得出的连续态阈值是有问题的。发现这种偏差是由被忽视的光学干涉和电折射效应引起的。我们提出了一个广义电调制模型来纳入这两种效应,并且在所有有机薄膜厚度下,提取的 Δp 和 Δu 在反射和透射模式下都具有出色的一致性。