Castillo M H, Button T M, Doerr R, Homs M I, Pruett C W, Pearce J I
Department of Surgery, State University of New York, Buffalo.
Am J Surg. 1988 Oct;156(4):261-3. doi: 10.1016/s0002-9610(88)80287-3.
The radiation dose in the vicinity of metal mandibular implants was measured using lithium fluoride (TLD-100) thermoluminescent dosimeters. Dosimeters were positioned in contact with Vitallium and stainless steel (AO) reconstruction plates. Simple transmission was measured with a solid state detector removed from the implant at a depth of 2.5 cm in a polystyrene phantom. The measurements were made for a 6 mV photon beam from a linear accelerator. At points in front of, but in contact with the metal implants, the dose was greater by 23 percent for Vitallium and 17 percent for stainless steel than that with no implant. At contact behind the implant, the dose was reduced considerably: 14 percent for Vitallium and 13 percent for stainless steel. At remote points behind the implant, the dose was reduced due to attenuation.
使用氟化锂（TLD - 100）热释光剂量计测量金属下颌植入物附近的辐射剂量。剂量计放置在与维他灵和不锈钢（AO）重建板接触的位置。在聚苯乙烯体模中，从植入物中取出固态探测器，在2.5厘米深度处测量简单透射率。测量是针对直线加速器产生的6 mV光子束进行的。在金属植入物前方但与之接触的点处，维他灵的剂量比无植入物时高23%，不锈钢的剂量比无植入物时高17%。在植入物后方接触处，剂量大幅降低：维他灵降低14%，不锈钢降低13%。在植入物后方远处的点处，剂量因衰减而降低。
