Alam Khurshed, Sim Yelyn, Yu Ji-Hun, Gnanaprakasam Janani, Choi Hyeonuk, Chae Yujin, Sim Uk, Cho Hoonsung
Department of Materials Science and Engineering, Chonnam National University, Gwangju, 61186, Korea.
Center for 3D Printing Materials Research, Korea Institute of Materials Science, Changwon 41508, Korea.
Materials (Basel). 2019 Dec 18;13(1):12. doi: 10.3390/ma13010012.
The vacuum deposition method requires high energy and temperature. Hydrophobic reduced graphene oxide (rGO) can be obtained by plasma-enhanced chemical vapor deposition under atmospheric pressure, which shows the hydrophobic surface property. Further, to compare the effect of hydrophobic and the hydrophilic nature of catalysts in the photoelectrochemical cell (PEC), the prepared rGO was additionally treated with plasma that attaches oxygen functional groups effectively to obtain hydrophilic graphene oxide (GO). The hydrogen evolution reaction (HER) electrocatalytic activity of the hydrophobic rGO and hydrophilic GO deposited on the p-type Si wafer was analyzed. Herein, we have proposed a facile way to directly deposit the surface property engineered GO.
真空沉积法需要高能量和高温。通过常压下的等离子体增强化学气相沉积可以获得疏水还原氧化石墨烯（rGO），其具有疏水表面特性。此外，为了比较光化学电池（PEC）中催化剂的疏水和亲水性质的影响，对制备的rGO额外进行等离子体处理，有效地附着氧官能团以获得亲水性氧化石墨烯（GO）。分析了沉积在p型硅片上的疏水rGO和亲水GO的析氢反应（HER）电催化活性。在此，我们提出了一种直接沉积表面性质工程化的GO的简便方法。
