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碱性条件下铜单晶的指纹伏安图:基础机理分析

Fingerprint Voltammograms of Copper Single Crystals under Alkaline Conditions: A Fundamental Mechanistic Analysis.

作者信息

Tiwari Aarti, Heenen Hendrik H, Bjørnlund Anton Simon, Maagaard Thomas, Cho EunAe, Chorkendorff Ib, Kristoffersen Henrik H, Chan Karen, Horch Sebastian

机构信息

Department of Physics , Technical University of Denmark (DTU) , Fysikvej 311 , 2800 Kgs. Lyngby , Denmark.

Department of Materials Science and Engineering , KAIST , Yuseong-gu, Daejeon 305-701 , Republic of Korea.

出版信息

J Phys Chem Lett. 2020 Feb 20;11(4):1450-1455. doi: 10.1021/acs.jpclett.9b03728. Epub 2020 Feb 6.

Abstract

A critical step toward the systematic development of electrocatalysts is the determination of the microscopic structure and processes at the electrified solid/electrolyte interface. The major challenges toward this end for experiment and computations are achieving sufficient cleanliness and modeling the complexity of electrochemical systems, respectively. In this sense, benchmarks of well-defined model systems are sparse. This work presents a rigorous joint experimental-theoretical study on the single-crystal (SC) Cu/aqueous interface. Within typical computational uncertainties, we find quantitative agreement between simulated and experimentally measured voltammograms, which allows us to unequivocally identify the OH adsorption feature in the fingerprint region of Cu(110), Cu(100), and Cu(111) SCs under alkaline conditions. We find the inclusion of hydrogen evolution reaction kinetics in the theoretical model to be crucial for an accurate steady-state description that gives rise to a negligible H coverage. A purely thermodynamic description of the H* coverage through a Pourbaix analysis would incorrectly lead to a H* adsorption peak. The presented results establish a fundamental benchmark for all electrochemical applications of Cu.

摘要

实现电催化剂系统开发的关键一步是确定带电固体/电解质界面的微观结构和过程。为此,实验和计算面临的主要挑战分别是实现足够的清洁度和对电化学系统的复杂性进行建模。从这个意义上说,定义明确的模型系统的基准很少。这项工作对单晶(SC)铜/水界面进行了严格的实验 - 理论联合研究。在典型的计算不确定性范围内,我们发现模拟和实验测量的伏安图之间存在定量一致性,这使我们能够明确识别碱性条件下Cu(110)、Cu(100)和Cu(111)单晶指纹区域中的OH吸附特征。我们发现,在理论模型中纳入析氢反应动力学对于准确的稳态描述至关重要,该描述导致H覆盖率可忽略不计。通过Pourbaix分析对H覆盖率进行纯粹的热力学描述会错误地导致H吸附峰。所呈现的结果为铜的所有电化学应用建立了一个基本基准。

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