Eschimèse Damien, Vaurette François, Mélin Thierry, Arscott Steve
Institut d'Electronique, de Microélectronique et de Nanotechnologie (IEMN), CNRS, The University of Lille, Cité Scientifique, 59652, Villeneuve d'Ascq, France. Horiba France SAS, 231 Rue de Lille, 59650, Villeneuve-d'Ascq, France.
Nanotechnology. 2020 May 29;31(22):225302. doi: 10.1088/1361-6528/ab746e. Epub 2020 Feb 10.
The ability to fabricate nanocones with precise dimensions is essential for several emerging applications. We demonstrate here a method which can be used to fabricate arrays of gold nanocones with high dimensional precision using lithographic and lift-off means. electron beam (ebeam) writing of a spin-coated PMMA-based bilayer resist deposited onto silicon wafers is used to form a shadow mask. This mask gradually closes as the deposition of gold (using ebeam evaporation) proceeds-the result is arrays of gold nanocones on the silicon wafer surface after lift-off of the resist. Observations using scanning electron microscopy enable a statistical study of the dimensions of 360 gold nanocones-the results demonstrate the high precision of the nanocones dimensions. The fabrication process enables the creation of arrays of nanocones with a base diameter varying from 53.6 ± 2.1 nm to 94.1 ± 2.4 nm, a vertical height ranging from 71.3 ± 4.1 nm to 153.4 ± 3.4 nm, and an apex radius of curvature ranging from 8.4 ± 1.2 nm to 11.6 ± 1.5 nm. The results are compared with the predictions of a deposition model which considers the evolving shadow masking during the gold deposition to compute the nanocone profile.
制造具有精确尺寸的纳米锥对于多种新兴应用至关重要。我们在此展示一种方法，该方法可用于通过光刻和剥离手段制造具有高尺寸精度的金纳米锥阵列。将旋涂的基于聚甲基丙烯酸甲酯（PMMA）的双层抗蚀剂电子束（ebeam）写入沉积在硅片上，以形成荫罩。随着金的沉积（使用电子束蒸发）进行，该荫罩逐渐闭合——抗蚀剂剥离后，结果是在硅片表面形成金纳米锥阵列。使用扫描电子显微镜进行观察能够对360个金纳米锥的尺寸进行统计研究——结果证明了纳米锥尺寸的高精度。该制造工艺能够创建基底直径从53.6 ± 2.1纳米变化到94.1 ± 2.4纳米、垂直高度从71.3 ± 4.1纳米变化到153.4 ± 3.4纳米、顶点曲率半径从8.4 ± 1.2纳米变化到11.6 ± 1.5纳米的纳米锥阵列。将结果与沉积模型的预测进行比较，该模型考虑了金沉积过程中不断演变的荫罩以计算纳米锥轮廓。
