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硅基独立式氮化镓上钯肖特基接触中的电流传输机制

Current Transport Mechanism in Palladium Schottky Contact on Si-Based Freestanding GaN.

作者信息

Lee Moonsang, Ahn Chang Wan, Vu Thi Kim Oanh, Lee Hyun Uk, Jeong Yesul, Hahm Myung Gwan, Kim Eun Kyu, Park Sungsoo

机构信息

Research Center for Materials Analysis, Korea Basic Science Institute, Gwahak-ro 169-148, Yuseong-gu, Daejeon 34133, Korea.

Department of Physics and Research Institute for Convergence of Basic Sciences, Hanyang University, Seoul 04763, Korea.

出版信息

Nanomaterials (Basel). 2020 Feb 10;10(2):297. doi: 10.3390/nano10020297.

Abstract

In this study, the charge transport mechanism of Pd/Si-based FS-GaN Schottky diodes was investigated. A temperature-dependent current-voltage analysis revealed that the I-V characteristics of the diodes show a good rectifying behavior with a large ratio of 10-10 at the forward to reverse current at ±1 V. The interface states and non-interacting point defect complex between the Pd metal and FS-GaN crystals induced the inhomogeneity of the barrier height and large ideality factors. Furthermore, we revealed that the electronic conduction of the devices prefers the thermionic field emission (TFE) transport, not the thermionic emission (TE) model, over the entire measurement conditions. The investigation on deep level transient spectroscopy (DLTS) suggests that non-interacting point-defect-driven tunneling influences the charge transport. This investigation about charge transport paves the way to achieving next-generation optoelectronic applications using Si-based FS-GaN Schottky diodes.

摘要

在本研究中,对基于钯/硅的全耗尽型氮化镓肖特基二极管的电荷传输机制进行了研究。温度相关的电流-电压分析表明,二极管的电流-电压特性呈现出良好的整流行为,在±1 V时正向与反向电流之比高达10¹⁰。钯金属与全耗尽型氮化镓晶体之间的界面态和非相互作用点缺陷复合体导致了势垒高度的不均匀性和较大的理想因子。此外,我们发现,在整个测量条件下,器件的电子传导更倾向于热电子场发射(TFE)传输,而非热电子发射(TE)模型。对深能级瞬态谱(DLTS)的研究表明,非相互作用点缺陷驱动的隧穿影响电荷传输。这项关于电荷传输的研究为使用基于硅的全耗尽型氮化镓肖特基二极管实现下一代光电子应用铺平了道路。

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