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用于原子级薄且多功能电子器件的石墨烯与过渡金属二硫属化物的空间可控横向异质结构。

Spatially controlled lateral heterostructures of graphene and transition metal dichalcogenides toward atomically thin and multi-functional electronics.

作者信息

Kim Gwangwoo, Shin Hyeon Suk

机构信息

Department of Chemistry, Ulsan National Institute of Science & Technology (UNIST), Ulsan 44919, Republic of Korea.

出版信息

Nanoscale. 2020 Mar 5;12(9):5286-5292. doi: 10.1039/c9nr10859a.

Abstract

Edge contacts between two-dimensional (2D) materials in the in-plane direction can achieve minimal contact area and low contact resistance, producing atomically thin devices with improved performance. Particularly, lateral heterojunctions of metallic graphene and semiconducting transition metal dichalcogenides (TMDs) exhibit small Schottky barrier heights due to graphene's low work-function. However, issues exist with the fabrication of highly transparent and flexible multi-functional devices utilizing lateral heterostructures (HSs) of graphene and TMDs via spatially controlled growth. This review demonstrates the growth and electronic applications of lateral HSs of graphene and TMDs, highlighting key technologies controlling the wafer-scale growth of continuous films for practical applications. It deepens the understanding of the spatially controlled growth of lateral HSs using chemical vapor deposition methods, and also contributes to the applications that depend on the scale-up of all-2D electronics with ultra-high electrical performance.

摘要

二维(2D)材料在平面内方向上的边缘接触能够实现最小的接触面积和低接触电阻,从而制造出性能得到改善的原子级薄器件。特别是,金属性石墨烯与半导体过渡金属二卤化物(TMDs)的横向异质结由于石墨烯的低功函数而呈现出较小的肖特基势垒高度。然而,通过空间控制生长来制造利用石墨烯和TMDs的横向异质结构(HSs)的高透明且柔性的多功能器件存在问题。本综述展示了石墨烯和TMDs横向HSs的生长及其电子应用,突出了控制用于实际应用的连续薄膜的晶圆级生长的关键技术。它加深了对使用化学气相沉积方法进行横向HSs空间控制生长的理解,也有助于依赖具有超高电性能的全二维电子器件扩大规模的应用。

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