Picard Julian F, Schaub Samuel C, Rosenzweig Guy, Stephens Jacob C, Shapiro Michael A, Temkin Richard J
Plasma Science and Fusion Center, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA.
Appl Phys Lett. 2019 Apr 22;114(16):164102. doi: 10.1063/1.5093639. Epub 2019 Apr 24.
A laser-driven semiconductor switch (LDSS) employing silicon (Si) and gallium arsenide (GaAs) wafers has been used to produce nanosecond-scale pulses from a 3 s, 110 GHz gyrotron at the megawatt power level. Photoconductivity was induced in the wafers using a 532 nm laser, which produced 6 ns, 230 mJ pulses. Irradiation of a single Si wafer by the laser produced 110 GHz RF pulses with a 9 ns width and >70% reflectance. Under the same conditions, a single GaAs wafer yielded 24 ns 110 GHz RF pulses with >78% reflectance. For both semiconductor materials, a higher value of reflectance was observed with increasing 110 GHz beam intensity. Using two active wafers, pulses of variable length down to 3 ns duration were created. The switch was tested at incident 110 GHz RF power levels up to 600 kW. A 1-D model is presented that agrees well with the experimentally observed temporal pulse shapes obtained with a single Si wafer. The LDSS has many potential uses in high power millimeter-wave research, including testing of high-gradient accelerator structures.
一种采用硅(Si)和砷化镓(GaAs)晶片的激光驱动半导体开关(LDSS)已被用于从兆瓦功率水平的3秒、110吉赫兹回旋管产生纳秒级脉冲。使用532纳米激光在晶片中诱导光电导,该激光产生6纳秒、230毫焦的脉冲。激光照射单个硅晶片产生宽度为9纳秒、反射率>70%的110吉赫兹射频脉冲。在相同条件下,单个砷化镓晶片产生反射率>78%的24纳秒110吉赫兹射频脉冲。对于这两种半导体材料,随着110吉赫兹光束强度的增加,观察到更高的反射率值。使用两个有源晶片,产生了持续时间低至3纳秒的可变长度脉冲。该开关在高达600千瓦的入射110吉赫兹射频功率水平下进行了测试。提出了一个一维模型,该模型与用单个硅晶片实验观察到的时间脉冲形状非常吻合。LDSS在高功率毫米波研究中有许多潜在用途,包括高梯度加速器结构的测试。