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羟乙氧基苯丁酮,一种新型化妆品防腐剂,不会导致抗菌药物的细菌交叉耐药性。

Hydroxyethoxy phenyl butanone, a new cosmetic preservative, does not cause bacterial cross-resistance to antimicrobials.

机构信息

Cardiff School of Pharmacy and Pharmaceutical Sciences, Cardiff University, Cardiff, UK.

L'Oréal Research and Innovation, Chevilly-Larue, France.

出版信息

J Med Microbiol. 2020 May;69(5):670-675. doi: 10.1099/jmm.0.001147. Epub 2020 Mar 18.

Abstract

Biocide-induced cross-resistance to antimicrobials in bacteria has been described and is a concern for regulators. We have recently reported on a new protocol to predict the propensity of biocide to induce phenotypic resistance in bacteria. To measure bacterial propensity to develop antimicrobial resistance following exposure to a new cosmetic preservative developed by L'Oréal R and I. Well-established antimicrobials including triclosan (TRI) and benzalkonium chloride (BZC) and a new molecule hydroxyethoxy phenyl butanone (HEPB) were investigated for their antimicrobial efficacy, effect on bacterial growth, and their potential to induce resistance to chemotherapeutic antibiotics using a new predictive protocol. The use of this predictive protocol with , and showed that TRI and BZC significantly affected bacterial growth, MICs and minimum bactericidal concentrations (MBCs). There was no change in antibiotic susceptibility profile following exposure to BZC, but became intermediate resistant to tobramycin following treatment with TRI (0.00002 % w/v). HEPB did not change the antimicrobial susceptibility profile in and but became susceptible to gentamicin. TRI exposure resulted in bacterial susceptibility profile alteration consistent with the literature and confirmed the use of TRI as a positive control in such a test. Data produced on the propensity of a molecule to induce bacterial resistance is useful and appropriate when launching a new preservative.

摘要

杀菌剂诱导的细菌对抗微生物药物的交叉耐药性已经被描述出来,这引起了监管机构的关注。我们最近报告了一种新的方案,可以预测杀菌剂诱导细菌表型耐药的倾向。为了测量接触由欧莱雅研发和生产的新型化妆品防腐剂后细菌产生抗微生物药物耐药性的倾向,我们研究了包括三氯生(TRI)和苯扎氯铵(BZC)在内的几种已确立的抗菌剂以及一种新型分子羟乙氧基苯丁酮(HEPB)的抗菌功效、对细菌生长的影响,以及它们通过新的预测方案诱导化疗抗生素耐药的潜力。使用该预测方案,结果表明 TRI 和 BZC 显著影响了细菌生长、MIC 和最小杀菌浓度(MBC)。暴露于 BZC 后抗生素敏感性谱没有变化,但用 TRI(0.00002%w/v)处理后, 对妥布霉素的敏感性降低到中介水平。HEPB 未改变 和 中的抗生素敏感性谱,但 对庆大霉素的敏感性增加。TRI 暴露导致细菌敏感性谱改变,与文献一致,证实 TRI 可用作此类试验的阳性对照。在推出新型防腐剂时,评估分子诱导细菌耐药性倾向的数据是有用和合适的。

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