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锗基自由基与NF气相反应的实验与理论研究:氮原子上的均裂取代与氟原子夺取反应

Experimental and Theoretical Study on the Gas-Phase Reactions of Germyl Radicals with NF: Homolytic Substitution at the Nitrogen Atom vs Fluorine Abstraction.

作者信息

Antoniotti Paola, Benzi Paola, Marabello Domenica, Rosso Daniele

机构信息

Dipartimento di Chimica, Università di Torino, Via P. Giuria, 7, 10125 Torino, Italy.

CRISDI, Interdepartmental Centre for Crystallography, University of Turin, 10124 Torino, Italy.

出版信息

ACS Omega. 2020 Mar 3;5(10):4907-4914. doi: 10.1021/acsomega.9b03729. eCollection 2020 Mar 17.

Abstract

In this paper, we report on the unexplored reaction mechanisms of bimolecular homolytic substitution (S2) between GeH radicals and the nitrogen atom of NF. The S2 reactions are studied both experimentally and theoretically with ab initio and density functional theory (DFT) calculations. The experimental results of X-ray irradiation of mixtures of GeH and NF show the formation of GeH-NF and GeH-F. The trend of product yields as a function of the increase in GeH partial pressure in the irradiated mixtures evidences the predominant role of GeH radicals. Particularly, the S2 mechanism can be hypothesized for the reaction between GeH radicals and NF molecules leading to GeH-NF. This mechanism is further confirmed by the increase in GeH-NF yield observed if O is added, as a radical scavenger, to the reaction mixture. In agreement with the experimental data, from the calculations performed at the CCSD(T) and G3B3 levels of theory, we observe that the GeH-NF product actually occurs from a bimolecular homolytic substitution by the GeH radical, which attacks the N atom of NF, and this reaction is in competition with the fluorine abstraction reaction leading to GeHF, even if other mechanisms may be involved in the formation of this product.

摘要

在本文中,我们报告了GeH自由基与NF的氮原子之间双分子均裂取代反应(S2)尚未被探索的反应机制。通过从头算和密度泛函理论(DFT)计算,对S2反应进行了实验和理论研究。对GeH和NF混合物进行X射线辐照的实验结果表明形成了GeH-NF和GeH-F。辐照混合物中产物产率随GeH分压增加的变化趋势证明了GeH自由基的主要作用。特别是,对于GeH自由基与NF分子之间生成GeH-NF的反应,可以假设其为S2机制。如果向反应混合物中加入作为自由基清除剂的O,观察到GeH-NF产率增加,这进一步证实了该机制。与实验数据一致,从在CCSD(T)和G3B3理论水平上进行的计算中,我们观察到GeH-NF产物实际上是由GeH自由基进行双分子均裂取代反应生成的,该自由基攻击NF的N原子,并且即使该产物的形成可能涉及其他机制,此反应也与生成GeHF的氟原子夺取反应相互竞争。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a6d6/7081285/fd3c9ed31cc7/ao9b03729_0004.jpg

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