School of Materials Engineering, Shanghai University of Engineering Science, Shanghai, People's Republic of China.
School of Materials Engineering, Nanjing University of Science and Technology, Nanjing, People's Republic of China.
Environ Technol. 2021 Sep;42(23):3581-3594. doi: 10.1080/09593330.2020.1737243. Epub 2020 Mar 27.
In this work, the CdS quantum dots (QDs) decorated BiMoO/BiMoO (BMO) heterojunction photocatalyst (C/BMO) has been successfully synthesized using a facile two-step hydrothermal method. The as-prepared photocatalysts were characterized by XRD, FTIR, XPS, FESEM, TEM, UV-vis DRS, PL and photoelectrochemical measurements to investigate the effects of CdS(QDs) and BMO heterojunction on the structure, morphology, optical and charge carrier transmission characteristics of the photocatalysts. Narrow band gap and superior catalytic activities were found in C/BMO as compared with pure BMO. Moreover, the C/BMO photocatalyst containing twice CdS content (2-C/BMO) exhibits even higher photocatalytic activity and stability. After exposure to visible light for 30 min, the degradation rate of Rhodamine B (RhB), Methylene blue (MB) and Ofloxacin (OFX) by 2-C/BMO reached 95%, 92% and 76%, respectively. Radicals scavenging experiments and electron spin-resonance spectroscopy (ESR) investigations indicated that the superoxide radical anions ( ), hole (h) and hydroxyl radicals (•OH) are the dominating active species in the photodegradation processes. and h are the key factors in the degradation of RhB and OFX solutions, and •OH is the major determinant in removal of MB. The process and photocatalytic mechanism on 2-C/BMO was discussed. Well absorption of visible light, effective separation of photoelectron-hole pairs and the transportation of photogenerated carriers at the interfaces of ternary semiconductor heterojunction are suggested as the key factors to enhance the photocatalytic performance of the photocatalysts.
在这项工作中,通过简便的两步水热法成功合成了 CdS 量子点(QD)修饰的 BiMoO/BiMoO(BMO)异质结光催化剂(C/BMO)。采用 XRD、FTIR、XPS、FESEM、TEM、UV-vis DRS、PL 和光电化学测量对所制备的光催化剂进行了表征,以研究 CdS(QD)和 BMO 异质结对光催化剂结构、形态、光学和载流子传输特性的影响。与纯 BMO 相比,C/BMO 具有更窄的带隙和更高的催化活性。此外,含有两倍 CdS 含量的 C/BMO 光催化剂(2-C/BMO)表现出更高的光催化活性和稳定性。在可见光照射 30 分钟后,2-C/BMO 对 Rhodamine B(RhB)、亚甲蓝(MB)和氧氟沙星(OFX)的降解率分别达到 95%、92%和 76%。自由基捕获实验和电子自旋共振谱(ESR)研究表明,超氧阴离子自由基( )、空穴(h)和羟基自由基(•OH)是光降解过程中的主要活性物质。 和 h 是 RhB 和 OFX 溶液降解的关键因素,而•OH 是去除 MB 的主要决定因素。讨论了 2-C/BMO 的反应过程和光催化机理。建议可见光的有效吸收、光生载流子在三元半导体异质结界面的有效分离和输运是提高光催化剂光催化性能的关键因素。