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硅基和锗基偕羧基酸:相应的硅基和锗基自由基前体。

Sila- and Germacarboxylic Acids: Precursors for the Corresponding Silyl and Germyl Radicals.

机构信息

Graduate School of Pharmaceutical Sciences, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-0033, Japan.

Cluster for Pioneering Research (CPR), Advanced Elements Chemistry Laboratory, RIKEN, 2-1 Hirosawa, Wako, Saitama, 351-0198, Japan.

出版信息

Angew Chem Int Ed Engl. 2020 Jun 22;59(26):10639-10644. doi: 10.1002/anie.202003070. Epub 2020 Apr 15.

Abstract

Silicon-containing compounds are widely used as synthetic building blocks, functional materials, and bioactive reagents. In particular, silyl radicals are important intermediates for the synthesis and transformation of organosilicon compounds. Herein, we describe the first protocol for the generation of silyl radicals by photoinduced decarboxylation of silacarboxylic acids, which can be easily prepared in high yield on a gram scale and are very stable to air and moisture. Irradiation of silacarboxylic acids with blue LEDs (455 nm) in the presence of a commercially available photocatalyst releases silyl radicals, which can further react with various alkenes to give the corresponding silylated products in good-to-high yields with broad functional-group compatibility. This reaction proceeds in the presence of water, enabling efficient deuterosilylation of alkenes with D O as the deuterium source. Germyl radicals were similarly obtained.

摘要

含硅化合物被广泛用作合成砌块、功能材料和生物活性试剂。特别是,硅自由基是有机硅化合物合成和转化的重要中间体。在此,我们描述了通过硅烷羧酸的光诱导脱羧反应生成硅自由基的第一个方案,硅烷羧酸可在克级规模上以高产率方便地制备,且对空气和水分非常稳定。在商业上可获得的光催化剂存在下,用蓝色 LED(455nm)照射硅烷羧酸,释放硅自由基,其可以进一步与各种烯烃反应,以良好至高产率得到具有广泛官能团兼容性的相应硅烷基化产物。该反应在水存在下进行,能够有效地用 D2O 作为氘源对烯烃进行氘硅烷基化。同样获得了锗基自由基。

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