Yang Le, Randel Emmett, Vajente Gabriele, Ananyeva Alena, Gustafson Eric, Markosyan Ashot, Bassiri Riccardo, Fejer Martin, Menoni Carmen
Appl Opt. 2020 Feb 10;59(5):A150-A154. doi: 10.1364/AO.59.00A150.
Amorphous tantala () thin films were deposited by reactive ion beam sputtering with simultaneous low energy assist or /2+ bombardment. Under the conditions of the experiment, the as-deposited thin films are amorphous and stoichiometric. The refractive index and optical band gap of thin films remain unchanged by ion bombardment. Around 20% improvement in room temperature mechanical loss and 60% decrease in absorption loss are found in samples bombarded with 100-eV . A detrimental influence from low energy 2+ bombardment on absorption loss and mechanical loss is observed. Low energy bombardment removes excess oxygen point defects, while 2+ bombardment introduces defects into the tantala films.
通过反应离子束溅射并同时进行低能辅助或/2+轰击来沉积非晶钽酸薄膜。在实验条件下，沉积态薄膜为非晶且化学计量比的。薄膜的折射率和光学带隙不受离子轰击影响。在用100电子伏特轰击的样品中，发现室温下机械损耗提高了约20%，吸收损耗降低了60%。观察到低能2+轰击对吸收损耗和机械损耗有不利影响。低能轰击去除了多余的氧点缺陷，而2+轰击则在钽酸薄膜中引入了缺陷。
