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通过Ar+离子束增强沉积对具有混合界面的羟基磷灰石薄膜进行表征。

Characterization of hydroxyapatite film with mixed interface by Ar+ ion beam enhanced deposition.

作者信息

Li X, Weng J, Tong W, Zuo C, Zhang X, Wang P, Liu Z

机构信息

Institute of Materials Science & Technology, Sichuan University, Chengdu, China.

出版信息

Biomaterials. 1997 Nov;18(22):1487-93. doi: 10.1016/s0142-9612(97)00085-9.

DOI:10.1016/s0142-9612(97)00085-9
PMID:9426178
Abstract

Ar+ ion beam enhanced deposition (IBED) was used to produce a hydroxyapatite (HA) film on polished titanium substrates. In this study, the HA ceramic target was sputtered by an argon-ion beam with an energy of 1.5 KeV, and the sputtered film was intermittently bombarded by energetic argon-ions at 60 KeV. An effective Ca-Ti mixed layer produced by the energetic argon-ion bombardment was confirmed by using Auger electron spectroscopy. The characteristics of the deposited films were evaluated by Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy, X-ray diffraction (XRD) and scanning electron microscopy (SEM) analyses. XRD analysis revealed that the as-deposited film was amorphous, and a hydroxyapatite-type structure was obtained from the post-heat treatment of the deposited films. SEM observations showed that no distinct difference in surface morphology was found between the as-deposited and heat-treated samples for Ar+ IBED films, suggesting a strongly bonded HA film on the titanium substrate. In comparison with the HA target, some chemistry alterations were brought about in the deposited films, such as the incorporation of CO3, the loss of the OH groups and some distortion of the phosphate lattice.

摘要

采用氩离子束增强沉积(IBED)技术在抛光钛基体上制备羟基磷灰石(HA)薄膜。在本研究中,用能量为1.5 keV的氩离子束溅射HA陶瓷靶,并用60 keV的高能氩离子对溅射膜进行间歇轰击。利用俄歇电子能谱证实了高能氩离子轰击产生了有效的钙钛混合层。通过傅里叶变换红外光谱、X射线光电子能谱、X射线衍射(XRD)和扫描电子显微镜(SEM)分析对沉积膜的特性进行了评估。XRD分析表明,沉积态薄膜为非晶态,沉积膜经热处理后获得了羟基磷灰石型结构。SEM观察表明,Ar+离子束增强沉积(IBED)膜的沉积态和热处理态样品在表面形貌上没有明显差异,这表明在钛基体上形成了结合牢固的HA膜。与HA靶相比,沉积膜中发生了一些化学变化,如CO3的掺入、OH基团的损失和磷酸盐晶格的一些畸变。

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