Development of low-loss TiO waveguides.

TiO channel waveguides were fabricated using a DC sputter deposition process, followed by photolithography and reactive ion etching. A SiO cladding was deposited using evaporation. SEM, TEM and Raman measurements indicate the presence of both an amorphous and a crystalline phase. As the layer thickness increases, poly-crystalline structures start forming. Loss measurements were performed by imaging the scattered light from the top of the channel waveguides and fitting an exponential decay to the intensity profile. Propagation losses of 7.8 ± 0.52 dB/cm at a wavelength of 632.8 nm and 0.68 ± 0.46 dB/cm at a wavelength of 1010 nm were experimentally characterized.