Supercritical lens array in a centimeter scale patterned with maskless UV lithography.

Microlens arrays (MLAs) are widely used in optical imaging, dense wavelength division multiplexing, optical switching, and microstructure patterning, etc. However, the light modulation capability for both the conventional refractive-type MLA and planar diffractive-type MLA is still staying at the diffraction-limited scale. Here we propose and experimentally demonstrate a high numerical aperture (NA) supercritical lens (SCL) array which could achieve a sub-diffraction-limited focal spot lattice in the far field. The intensity distribution for all the focal spots has good uniformity with the lateral size around ${0.45}\lambda {\rm /NA}$0.45λ/NA (0.75X Airy unit). The elementary unit in the SCL array composes a series of concentric belts with a feature size in micrometer scale. By utilizing an ultrafast ultraviolet lithography technique, a centimeter scale SCL array could be successfully patterned within 10 mins. Our results may provide possibilities for the applications in optical nanofabrication, super-resolution imaging, and ultrafine optical manipulation.