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MX/TiB异质结(M = Ge,Sn;X = S,Se,Te)的肖特基接触、隧穿概率和光学性质的第一性原理研究:应变工程可调性

First-Principles Study of the Schottky Contact, Tunneling Probability, and Optical Properties of MX/TiB Heterojunctions (M = Ge, Sn; X = S, Se, Te): Strain Engineering Tunability.

作者信息

Guo Hao, Pan Jinbo, Du Shixuan

机构信息

School of Urban Construction, Hebei Normal University of Science & Technology, Qinhuangdao 066004, China.

Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China.

出版信息

ACS Appl Mater Interfaces. 2024 Jun 19;16(24):31513-31523. doi: 10.1021/acsami.4c05905. Epub 2024 Jun 5.

Abstract

Designing two-dimensional (2D) heterojunctions with rapid response and minimal energy consumption holds immense significance for the advancement of the next generation of electronic devices. Here, we construct a series of Schottky heterojunctions based on TiB monolayer and group-IV monochalcogenide monolayers MX (M = Ge, Sn; X = S, Se, Te). Using first-principles calculations, we investigate the structural stability, Schottky contact barrier, tunneling probability, and optical properties of MX/TiB heterojunctions. The calculated binding energies reveal that X-type MX/TiB heterojunctions exhibit more stable structures than M- and C-type stacking modes. Schottky barrier heights (SBHs) indicate that X-type GeSe/TiB and GeTe/TiB form n-type Schottky contacts with SBHs of 0.497 and 0.132 eV, respectively, while SnS/TiB and SnSe/TiB form p-type Schottky contacts with SBHs of 0.557 and 0.418 eV, respectively. Moreover, X-type MX/TiB heterojunctions exhibit high susceptibility to interlayer electron tunneling due to their large tunneling probability and strong interlayer interaction. Meanwhile, enhanced optical absorption capacity in MX/TiB heterojunctions is also observed compared with individual TiB and MX monolayers. By applying in-plane biaxial strain, the transformation of MX/TiB heterojunctions from a Schottky contact to an Ohmic contact can also be realized. Our findings could offer valuable candidate materials and guidance for the design of the next generation of nanodevices with high electronic and optical performances.

摘要

设计具有快速响应和最低能耗的二维(2D)异质结对于下一代电子器件的发展具有极其重要的意义。在此,我们基于TiB单层和IV族单硫属化物单层MX(M = Ge、Sn;X = S、Se、Te)构建了一系列肖特基异质结。利用第一性原理计算,我们研究了MX/TiB异质结的结构稳定性、肖特基接触势垒、隧穿概率和光学性质。计算得到的结合能表明,X型MX/TiB异质结比M型和C型堆叠模式表现出更稳定的结构。肖特基势垒高度(SBHs)表明,X型GeSe/TiB和GeTe/TiB分别形成n型肖特基接触,SBHs分别为0.497和0.132 eV,而SnS/TiB和SnSe/TiB分别形成p型肖特基接触,SBHs分别为0.557和0.418 eV。此外,X型MX/TiB异质结由于其大的隧穿概率和强的层间相互作用而表现出对层间电子隧穿的高敏感性。同时,与单个TiB和MX单层相比,MX/TiB异质结中的光吸收能力也有所增强。通过施加面内双轴应变,还可以实现MX/TiB异质结从肖特基接触到欧姆接触的转变。我们的研究结果可为设计具有高电子和光学性能的下一代纳米器件提供有价值的候选材料和指导。

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