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一种具有高适配体覆盖密度的适配体@金纳米粒子修饰的倍半硅氧烷-聚乙烯亚胺杂化亲和整体柱,用于灵敏且选择性地识别赭曲霉毒素A。

An aptamer@AuNP-modified POSS-polyethylenimine hybrid affinity monolith with a high aptamer coverage density for sensitive and selective recognition of ochratoxin A.

作者信息

Yu Xia, Song Hongliang, Huang Jing, Chen Yongxuan, Dai Ming, Lin Xucong, Xie Zenghong

机构信息

Institute of Food Safety and Environment Monitoring, Fuzhou University, Fuzhou, 350108, China.

出版信息

J Mater Chem B. 2018 Apr 7;6(13):1965-1972. doi: 10.1039/c7tb03319b. Epub 2018 Mar 16.

Abstract

A novel hybrid affinity monolith with a high aptamer coverage density was developed via a highly efficient modification of aptamer@gold nanoparticles (Apt@AuNPs) on a well-controlled 3D skeletal POSS-polyethylenimine (PEI) matrix. The effects of amine reagents and the skeletal structures of the hybrid monoliths on the modification efficiency of Apt@AuNPs were studied, and the resultant Apt@AuNPs@POSS-PEI1200 monolith was proposed with a high coverage density of aptamer of up to 1413 pmol μL, which is 4-5 times more than the coverage density when modified with Apt@AuNPs that was reported previously. Characterization including morphology, spectra analysis, mechanical stability, binding capacity and specificity studies was also carried out. Significant specific recognition targeting of ochratoxin A (OTA) was achieved with a detection limit as low as 0.06 ng mL. High recoveries of OTA were achieved of 92.6 ± 1.3% to 94.7 ± 1.4% (n = 3), while the cross-reactivity towards analogues such as ochratoxin B (OTB) and aflatoxin B (AFB) was weak. This highlights a facile approach to POSS-based affinity monoliths with a high aptamer coverage density for sensitive and selective recognition of a trace target (OTA).

摘要

通过在可控的三维骨架倍半硅氧烷 - 聚乙烯亚胺(POSS-PEI)基质上高效修饰适配体@金纳米颗粒(Apt@AuNPs),开发了一种具有高适配体覆盖密度的新型混合亲和整体柱。研究了胺试剂和混合整体柱的骨架结构对Apt@AuNPs修饰效率的影响,并提出了所得的Apt@AuNPs@POSS-PEI1200整体柱,其适配体覆盖密度高达1413 pmol μL,比先前报道的用Apt@AuNPs修饰时的覆盖密度高4至5倍。还进行了包括形态、光谱分析、机械稳定性、结合能力和特异性研究在内的表征。实现了对赭曲霉毒素A(OTA)的显著特异性识别,检测限低至0.06 ng mL。OTA的回收率很高,为92.6±1.3%至94.7±1.4%(n = 3),而对赭曲霉毒素B(OTB)和黄曲霉毒素B(AFB)等类似物的交叉反应较弱。这突出了一种简便的方法来制备具有高适配体覆盖密度的基于POSS的亲和整体柱,用于灵敏且选择性地识别痕量目标物(OTA)。

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