Gisbert Victor G, Garcia Ricardo
Instituto de Ciencia de Materiales de Madrid, CSIC, c/Sor Juana Ines de la Cruz 3, 28049 Madrid, Spain.
Nanoscale. 2023 Dec 7;15(47):19196-19202. doi: 10.1039/d3nr05274e.
High-spatial resolution mapping of van der Waals forces is relevant in several fields ranging from nanotechnology to colloidal science. The emergence of two-dimensional heterostructures assembled by van der Waals interactions has enhanced the interest of those measurements. Several AFM methods have been developed to measure the adhesion force between an AFM probe and the material of interest. However, a reliable and high-resolution method to measure the Hamaker constant remains elusive. We demonstrate that an atomic force microscope operated in a bimodal configuration enables fast, quantitative, and high-resolution mapping of the Hamaker constant of interfaces. The method is applied to map the Hamaker constant of monolayer, bilayer and multilayer MoS surfaces. Those interfaces are characterized with Hamaker constant and spatial resolutions of, respectively, 0.1 eV and 50 nm.
范德华力的高空间分辨率映射在从纳米技术到胶体科学等多个领域都具有重要意义。由范德华相互作用组装而成的二维异质结构的出现，增加了人们对这些测量的兴趣。已经开发了几种原子力显微镜（AFM）方法来测量AFM探针与感兴趣材料之间的粘附力。然而，一种可靠的高分辨率测量哈梅克常数的方法仍然难以实现。我们证明，以双峰配置操作的原子力显微镜能够对界面的哈梅克常数进行快速、定量和高分辨率的映射。该方法被应用于绘制单层、双层和多层二硫化钼表面的哈梅克常数。这些界面的哈梅克常数和空间分辨率分别为0.1电子伏特和50纳米。
