Bhardwaj Kirti, Parvis FatemehSadat, Wang Yufeng, Blanchard Gary J, Swain Greg M
Department of Chemistry, Michigan State University, 578 South Shaw Lane, East Lansing, Michigan 48824-1322, United States.
Department of Chemical Engineering and Material Science, Michigan State University, 428 South Shaw Lane, East Lansing, Michigan 48824-1226, United States.
Langmuir. 2020 Jun 2;36(21):5717-5729. doi: 10.1021/acs.langmuir.0c00294. Epub 2020 May 15.
This paper reports on how the surface chemistry of boron-doped nanocrystalline diamond (BDD) thin-film electrodes (H vs O) affects the wettability and electrochemical properties in two room-temperature ionic liquids (RTILs): [BMIM][PF] and [HMIM][PF]. Comparative measurements were made in 0.5 mol L HSO. The BDD electrodes were modified by microwave or radio-frequency (RF) plasma treatment in H (H-BDD), Ar (Ar-BDD), or O (O-BDD). These modifications produced low-, medium-, and high-oxygen surface coverages. Atomic O/C ratios, as determined by X-ray photoelectron spectroscopy (XPS), were 0.01 for H-BDD, 0.08 for Ar-BDD, and 0.17 for O-BDD. The static contact angle of ultrapure water on the modified electrodes decreased from 110° (H-BDD) to 41° (O-BDD) with increasing surface oxygen coverage, as expected as the surface becomes more hydrophilic. Interestingly, the opposite trend was seen for both RTILs as the contact angle increased from 20° (H-BDD) to 50° (O-BDD) with increasing surface oxygen coverage. The cyclic voltammetric background current and potential-dependent capacitance in both RTILs were largest for BDD electrodes with the lowest O/C ratio (H-BDD) and smallest contact angle. Slightly larger voltammetric background currents and capacitance were observed in [HMIM][PF] than in [BMIM][PF]. Capacitance values ranged from 8 to 16 μF cm over the potential range for H-BDD and from 4 to 6 μF cm for O-BDD. The opposite trend was observed in HSO as the voltammetric background current and capacitance were largest for BDD electrodes with the highest O/C ratio (O-BDD) and smallest contact angle. In summary, reducing the surface oxygen on BDD electrodes increases the wettability to two RTILs and this increases the voltammetric background current and capacitance.
本文报道了硼掺杂纳米晶金刚石(BDD)薄膜电极(H对O)的表面化学如何影响两种室温离子液体(RTIL):[BMIM][PF]和[HMIM][PF]中的润湿性和电化学性质。在0.5 mol L HSO中进行了对比测量。BDD电极通过在H(H-BDD)、Ar(Ar-BDD)或O(O-BDD)中进行微波或射频(RF)等离子体处理进行改性。这些改性产生了低、中、高氧表面覆盖率。通过X射线光电子能谱(XPS)测定的原子O/C比,H-BDD为0.01,Ar-BDD为0.08,O-BDD为0.17。随着表面氧覆盖率的增加,超纯水在改性电极上的静态接触角从110°(H-BDD)降至41°(O-BDD),正如预期的那样,表面变得更亲水。有趣的是,对于两种RTIL,观察到相反的趋势,随着表面氧覆盖率的增加,接触角从20°(H-BDD)增加到50°(O-BDD)。对于O/C比最低(H-BDD)且接触角最小的BDD电极,两种RTIL中的循环伏安背景电流和电位依赖性电容最大。在[HMIM][PF]中观察到的伏安背景电流和电容略大于[BMIM][PF]。H-BDD的电容值在电位范围内为8至16 μF cm,O-BDD为4至6 μF cm。在HSO中观察到相反的趋势,因为对于O/C比最高(O-BDD)且接触角最小的BDD电极,伏安背景电流和电容最大。总之,降低BDD电极上的表面氧会增加对两种RTIL的润湿性,这会增加伏安背景电流和电容。