Daqiqeh Rezaei Soroosh, Ho Jinfa, Wang Tao, Ramakrishna Seeram, Yang Joel K W
Nanofabrication Department, Institute of Materials Research and Engineering (IMRE), Agency for Science, Technology and Research (A*STAR), 2 Fusionopolis Way, 138634 Singapore.
Department of Mechanical Engineering, Faculty of Engineering, National University of Singapore, 117575 Singapore.
Nano Lett. 2020 Jun 10;20(6):4422-4429. doi: 10.1021/acs.nanolett.0c01191. Epub 2020 Jun 1.
The direct patterning of colors using the bombardment of a focused beam of electrons onto a thin-film stack consisting of poly(methyl methacrylate) coated with a thin nickel film is demonstrated. This direct electron-beam color printing approach creates variations in the height of a Fabry-Perot (FP) cavity, resulting directly in a color print without the need for prepatterned substrates, distinct from some direct laser writing methods. Notably, the resolution of the color prints is defined by the electron beam. Height measurements with ∼5 nm accuracy through color image analysis of an electron-beam-patterned FP cavity were carried out. This technique also introduces a reflectance-based measurement of the point exposure function of a focused electron beam, aiding in rapid proximity effect corrections. In addition, the grayscale lithographic nature of this process was used to produce blazed gratings and could enable the fabrication of other 2.5D nanostructures with precise height control.
展示了通过将聚焦电子束轰击到由涂有薄镍膜的聚甲基丙烯酸甲酯组成的薄膜堆栈上来直接进行颜色图案化。这种直接电子束彩色印刷方法会在法布里-珀罗（FP）腔的高度上产生变化，直接形成彩色印刷品，无需预先图案化的基板，这与一些直接激光写入方法不同。值得注意的是，彩色印刷品的分辨率由电子束决定。通过对电子束图案化的FP腔进行彩色图像分析，进行了精度约为5 nm的高度测量。该技术还引入了基于反射率的聚焦电子束点曝光函数测量，有助于快速进行邻近效应校正。此外，该工艺的灰度光刻特性被用于制造闪耀光栅，并能够制造出其他具有精确高度控制的2.5D纳米结构。
