Institute of Nanostructure Technologies and Analytics (INA) and Center for Interdisciplinary Nanostructure Science and Technology (CINSaT), University of Kassel, Heinrich-Plett-Straße 40, 34132 Kassel, Germany.
Institute of Chemistry and Center for Interdisciplinary Nanostructure Science and Technology (CINSaT), University of Kassel, Heinrich-Plett-Straße 40, 34132 Kassel, Germany.
Molecules. 2020 May 23;25(10):2438. doi: 10.3390/molecules25102438.
In nanoimprint lithography (NIL), a pattern is created by mechanical deformation of an imprint resist via embossing with a stamp, where the adhesion behavior during the filling of the imprint stamp and its subsequent detachment may impose some practical challenges. Here we explored thermal and reverse NIL patterning of polyvinylferrocene and vinylferrocene-methyl methacrylate copolymers to prepare complex non-spherical objects and patterns. While neat polyvinylferrocene was found to be unsuitable for NIL, freshly-prepared vinylferrocene-methyl methacrylate copolymers, for which identity and purity were established, have been structured into 3D-micro/nano-patterns using NIL. The cross-, square-, and circle-shaped columnar structures form a 3 × 3 mm arrangement with periodicity of 3 µm, 1 µm, 542 nm, and 506 nm. According to our findings, vinylferrocene-methyl methacrylate copolymers can be imprinted without further additives in NIL processes, which opens the way for redox-responsive 3D-nano/micro-objects and patterns via NIL to be explored in the future.
在纳米压印光刻（NIL）中，通过压印用模具对压印胶进行机械变形来创建图案，其中在模具填充和随后的脱模过程中的粘附行为可能会带来一些实际挑战。在这里，我们探索了聚二茂铁基乙烯基和二茂铁基乙烯基甲基丙烯酸甲酯共聚物的热和反向 NIL 图案化，以制备复杂的非球形物体和图案。虽然纯聚二茂铁基乙烯基不适合 NIL，但已确定其身份和纯度的新鲜制备的二茂铁基乙烯基甲基丙烯酸甲酯共聚物已使用 NIL 结构成 3D 微/纳米图案。十字形、方形和圆形柱状结构以 3 µm、1 µm、542 nm 和 506 nm 的周期性排列形成 3×3 mm 的排列。根据我们的研究结果，二茂铁基乙烯基甲基丙烯酸甲酯共聚物可以在没有进一步添加剂的情况下在 NIL 工艺中进行压印，这为通过 NIL 探索未来的氧化还原响应 3D 纳米/微物体和图案开辟了道路。
