Department of Electrical and Computer Engineering, The University of Texas at Austin, 10100 Burnet Road, Building 160, Austin, Texas 78758, United States.
Nano Lett. 2020 Jul 8;20(7):5090-5096. doi: 10.1021/acs.nanolett.0c01277. Epub 2020 Jun 2.
Nanosphere lithography offers a rapid, low-cost approach for patterning of large-area two-dimensional periodic nanostructures. However, a complete understanding of the nanosphere self-assembly process is necessary to enable further development and scaling of this technology. The self-assembly of nanospheres into two-dimensional periodic arrays has previously been attributed solely to the Marangoni force; however, we demonstrate that the ζ potential of the nanosphere solution is critically important for successful self-assembly to occur. We discuss and demonstrate how this insight can be used to greatly increase self-assembled 2D periodic array areas while decreasing patterning time and cost. As a representative application, we fabricate antireflection nanostructures on a transparent flexible polymer substrate suitable for use as a large-area (270 cm), broadband, omnidirectional antireflection film.
纳米球光刻技术为大面积二维周期性纳米结构的图案化提供了一种快速、低成本的方法。然而，为了进一步发展和扩大这项技术，需要对纳米球自组装过程有一个完整的理解。纳米球自组装成二维周期性阵列以前仅归因于马兰戈尼力；然而，我们证明了纳米球溶液的 ζ 势对于成功的自组装至关重要。我们讨论并展示了如何利用这一见解来大大增加二维周期性阵列的自组装面积，同时减少图案化时间和成本。作为一个代表性的应用，我们在透明的柔性聚合物衬底上制造抗反射纳米结构，适用于大面积（270cm）、宽带、全向抗反射膜。
