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CoFeB薄膜中电压控制磁各向异性的底层材料相关对称和非对称行为

Underlayer material dependent symmetric and asymmetric behavior of voltage-controlled magnetic anisotropy in CoFeB films.

作者信息

Rana Bivas, Miura Katsuya, Takahashi Hiromasa, Otani YoshiChika

机构信息

Center for Emergent Matter Science, RIKEN, 2-1 Hirosawa, Wako 351-0198, Japan.

Research and Development Group, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan.

出版信息

J Phys Condens Matter. 2020 Jul 17;32(41). doi: 10.1088/1361-648X/ab99eb.

Abstract

Voltage-controlled magnetic anisotropy (VCMA), observed at the interfaces of ultrathin ferromagnetic metallic films and oxide layer, has proven to be a useful tool for the development of all-electric field controlled spintronics devices. Here, we have studied the symmetric and asymmetric behavior of VCMA in CoFeB/MgO heterostructures, grown on different underlayer materials, by measuring ferromagnetic resonance using spin pumping and inverse spin Hall effect technique. We observe symmetric behavior of VCMA in CoFeB films with Ta underlayer, whereas a systematic transformation from symmetric to asymmetric behavior of VCMA with decreasing CoFeB thickness is observed for Pt underlayer. We speculate that the increased interfacial roughness, defects and strain of ultrathin CoFeB films with Pt buffer layer probably leads to the complicated band structure at CoFeB/MgO interface resulting in asymmetric behavior of VCMA. The observed symmetric behavior of VCMA in control samples justifies the role of interfacial roughness, defects and discards the role of oxide overlayer on the observed asymmetric behavior of VCMA in ultrathin CoFeB films.

摘要

在超薄铁磁金属薄膜与氧化物层的界面处观察到的电压控制磁各向异性(VCMA),已被证明是开发全电场控制自旋电子器件的一种有用工具。在此,我们通过使用自旋泵浦和逆自旋霍尔效应技术测量铁磁共振,研究了生长在不同底层材料上的CoFeB/MgO异质结构中VCMA的对称和不对称行为。我们观察到在具有Ta底层的CoFeB薄膜中VCMA呈现对称行为,而对于Pt底层,随着CoFeB厚度减小,观察到VCMA从对称行为到不对称行为的系统转变。我们推测,具有Pt缓冲层的超薄CoFeB薄膜界面粗糙度、缺陷和应变的增加,可能导致CoFeB/MgO界面处复杂的能带结构,从而导致VCMA的不对称行为。在对照样品中观察到的VCMA对称行为,证明了界面粗糙度和缺陷的作用,并排除了氧化物覆盖层对超薄CoFeB薄膜中观察到的VCMA不对称行为的影响。

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