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磁控溅射制备的硅及掺杂铪的硅涂层的纳米压痕数据集

Nanoindentation dataset of silicon and hafnia doped silicon coatings produced by magnetron sputtering.

作者信息

Anton Ronja, Leisner Vito, Schulz Uwe

机构信息

German Aerospace Center (DLR), Institute of Materials Research, Cologne 51147, Germany.

出版信息

Data Brief. 2020 Jun 3;31:105800. doi: 10.1016/j.dib.2020.105800. eCollection 2020 Aug.

DOI:10.1016/j.dib.2020.105800
PMID:32596423
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC7306585/
Abstract

Mechanical properties of three different coatings comprising of pure silicon, 36 mol% HfO-doped silicon and 60 mol% HfO-doped silicon on SiC substrate material were obtained by nanoindentation. The coatings aim at oxidation protective layers in environmental barrier coating systems for SiC/SiC ceramic matrix composites (CMC). The examined coatings were produced by physical vapour deposition (magnetron sputtering) and have been tested under cycling conditions between room temperature and 1523 K until 100 h accumulated hot time. In order to measure the hardness and the reduced Young's modulus, a Berkovich tip has been used with a constant depth modulus of 100 nm and 160 nm. Two depth moduli have been chosen to investigate a possible volume impact on the mechanical properties. Six successfully produced indents have been averaged to examine the hardness and reduced Young's modulus. The testing has been done on polished cross sections thereby minimising the impact of the substrate material on the measured values. This article provides data related to "Hafnia-doped Silicon Bond Coats manufactured by PVD for SiC/SiC CMCs".

摘要

通过纳米压痕法获得了在碳化硅(SiC)基体材料上的三种不同涂层的力学性能,这三种涂层分别由纯硅、36摩尔%氧化铪(HfO)掺杂的硅和60摩尔%氧化铪掺杂的硅组成。这些涂层旨在作为碳化硅/碳化硅陶瓷基复合材料(CMC)环境障涂层系统中的抗氧化层。所研究的涂层通过物理气相沉积(磁控溅射)制备,并在室温至1523K的循环条件下进行了测试,累计热时间达100小时。为了测量硬度和折合杨氏模量,使用了具有100纳米和160纳米恒定深度模量的贝氏压头。选择了两个深度模量来研究可能的体积对力学性能的影响。对六个成功制作的压痕进行平均,以检测硬度和折合杨氏模量。测试在抛光横截面上进行,从而将基体材料对测量值的影响降至最低。本文提供了与“通过物理气相沉积法制造的用于碳化硅/碳化硅陶瓷基复合材料的氧化铪掺杂硅粘结涂层”相关的数据。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2733/7306585/150314551781/gr6.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2733/7306585/0ebe48afafd3/gr1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2733/7306585/f3c7f8a8d37e/gr2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2733/7306585/0ec883bf824b/gr3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2733/7306585/c2ac8f6bc2e9/gr4.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2733/7306585/66e364b6d133/gr5.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2733/7306585/150314551781/gr6.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2733/7306585/0ebe48afafd3/gr1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2733/7306585/f3c7f8a8d37e/gr2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2733/7306585/0ec883bf824b/gr3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2733/7306585/c2ac8f6bc2e9/gr4.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2733/7306585/66e364b6d133/gr5.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2733/7306585/150314551781/gr6.jpg

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