van Delden Sander H, Nazarideljou Mohammad Javad, Marcelis Leo F M
Horticulture and Product Physiology, Wageningen University, PO Box 16, 6700AA Wageningen, The Netherlands.
Department of Horticultural Science, Mahabad Branch, Islamic Azad University, Mahabad, Iran.
Plant Methods. 2020 May 18;16:72. doi: 10.1186/s13007-020-00606-4. eCollection 2020.
There is little information on the effect of nutrient solutions composition on Arabidopsis growth. Therefore, we compared growth performance of (Col-0) grown on the most commonly used nutrient solutions in deep water culture: Hoagland and Arnon, Murashige and Skoog, Tocquin, Hermans, and Conn. In addition to these nutrient solution composition experiments, we established Arabidopsis growth response curves for nutrient solution concentration and salt stress (NaCl).
Arabidopsis rosette fresh and dry weight showed an approximate linear decline with NaCl dose in deep water culture, i.e. 9% reduction relative to control per unit of electrical conductivity (EC in dS m, for scale comprehension 1 dS m equals ~ 10 mM NaCl). The Tocquin, ½Hoagland and Conn nutrient solutions had equal and optimal growth performance. Optimal nutrient solution concentration for Tocquin and Hoagland was 0.8 to 0.9 dS m. Close to the EC of ½Hoagland (1.1 dS m), which is frequently used in Arabidopsis research. Conn solution showed optimal growth at much higher EC (2 dS m) indicating that it is a balanced nutrient solution that matches the needs of Arabidopsis. Full Murashige and Skoog solution (5.9 dS m) was lethal and diluted solutions (EC of 1.6 and 1.1 dS m) caused stress symptoms and severe growth retardation at later developmental stages.
(Col-0) plants grown in deep water culture showed a sixfold growth difference when commonly used nutrient solutions were compared. Murashige and Skoog solution should not be used as nutrient solution in deep water culture. Conn, Tocquin and ½Hoagland are balanced nutrient solutions which result in optimal Arabidopsis growth in hydroponic systems.
关于营养液成分对拟南芥生长的影响，相关信息较少。因此，我们比较了在深水培养中最常用的营养液（霍格兰和阿农营养液、Murashige和Skoog营养液、托坎营养液、赫尔曼斯营养液和康恩营养液）上生长的（Col-0）拟南芥的生长表现。除了这些营养液成分实验外，我们还建立了拟南芥对营养液浓度和盐胁迫（NaCl）的生长响应曲线。
在深水培养中，拟南芥莲座叶的鲜重和干重随NaCl剂量呈近似线性下降，即每单位电导率（EC，单位为dS m，为便于理解，1 dS m约等于10 mM NaCl）相对于对照降低9%。托坎营养液、1/2霍格兰营养液和康恩营养液具有同等且最佳的生长表现。托坎营养液和霍格兰营养液的最佳营养液浓度为0.8至0.9 dS m，接近拟南芥研究中常用的1/2霍格兰营养液的EC（1.1 dS m）。康恩营养液在更高的EC（2 dS m）下表现出最佳生长，表明它是一种符合拟南芥需求的平衡营养液。完整的Murashige和Skoog营养液（5.9 dS m）具有致死性，稀释后的溶液（EC为1.6和1.1 dS m）在发育后期会引起胁迫症状并导致严重生长迟缓。
在深水培养中生长的（Col-0）植株，当比较常用营养液时，生长差异可达六倍。Murashige和Skoog营养液不应在深水培养中用作营养液。康恩营养液、托坎营养液和1/2霍格兰营养液是平衡营养液，可使拟南芥在水培系统中实现最佳生长。
