Choi Yu Min, Shin Han Young, Son Jongchan, Park Chunhee, Park Keun-Woo, Lee Jin-Kyun, Jung Byung Jun
Department of Materials Science and Engineering, University of Seoul, Seoul 02504, Korea.
Department of Polymer Science and Engineering, Inha University, Incheon 22212, Korea.
Micromachines (Basel). 2020 Jun 30;11(7):650. doi: 10.3390/mi11070650.
Nowadays, the display industry is endeavoring to develop technology to provide large-area organic light-emitting diode (OLED) display panels with 8K or higher resolution. Although the selective deposition of organic molecules through shadow masks has proven to be the method of choice for mobile panels, it may not be so when independently defined high-resolution pixels are to be manufactured on a large substrate. This technical challenge motivated us to adopt the well-established photolithographic protocol to the OLED pixel patterning. In this study, we demonstrate the two-color OLED pixels integrated on a single substrate using a negative-tone highly fluorinated photoresist (PR) and fluorous solvents. Preliminary experiments were performed to examine the probable damaging effects of the developing and stripping processes upon a hole-transporting layer (HTL). No significant deterioration in the efficiency of the develop-processed device was observed. Efficiency of the device after lift-off was up to 72% relative to that of the reference device with no significant change in operating voltage. The procedure was repeated to successfully obtain two-color pixel arrays. Furthermore, the patterning of 15 μm green pixels was accomplished. It is expected that photolithography can provide a useful tool for the production of high-resolution large OLED displays in the near future.
如今,显示行业正致力于开发技术,以提供具有8K或更高分辨率的大面积有机发光二极管(OLED)显示面板。尽管通过荫罩选择性沉积有机分子已被证明是制造移动面板的首选方法,但在大尺寸基板上制造独立定义的高分辨率像素时,情况可能并非如此。这一技术挑战促使我们将成熟的光刻工艺应用于OLED像素图案化。在本研究中,我们展示了使用负性高氟化光刻胶(PR)和含氟溶剂在单个基板上集成的双色OLED像素。进行了初步实验,以研究显影和剥离过程对空穴传输层(HTL)可能产生的破坏作用。未观察到显影处理后的器件效率有明显下降。剥离后器件的效率相对于参考器件高达72%,工作电压无明显变化。重复该过程成功获得了双色像素阵列。此外,还完成了15μm绿色像素的图案化。预计光刻技术在不久的将来可为高分辨率大型OLED显示器的生产提供有用的工具。