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通过缺陷介导的层间化学键合调节双层二硫化钼中的电导率

Tuning Electrical Conductance in Bilayer MoS through Defect-Mediated Interlayer Chemical Bonding.

作者信息

Zhang Lili, Wang Gang, Zhang Yubo, Cao Zhipeng, Wang Yu, Cao Tianjun, Wang Cong, Cheng Bin, Zhang Wenqing, Wan Xiangang, Lin Junhao, Liang Shi-Jun, Miao Feng

机构信息

National Laboratory of Solid State Microstructures, School of Physics, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210093,China.

Department of Physics, Southern University of Science and Technology, Shenzhen 518055, China.

出版信息

ACS Nano. 2020 Aug 25;14(8):10265-10275. doi: 10.1021/acsnano.0c03665. Epub 2020 Jul 29.

Abstract

Interlayer interaction could substantially affect the electrical transport in transition metal dichalcogenides, serving as an effective way to control the device performance. However, it is still challenging to utilize interlayer interaction in weakly interlayer-coupled materials such as pristine MoS to realize layer-dependent tunable transport behavior. Here, we demonstrate that, by substitutional doping of vanadium atoms in the Mo sites of the MoS lattice, the vanadium-doped monolayer MoS device exhibits an ambipolar field effect characteristic, while its bilayer device demonstrates a heavy -type field effect feature, in sharp contrast to the pristine monolayer and bilayer MoS devices, both of which show similar -type electrical transport behaviors. Moreover, the electrical conductance of the doped bilayer MoS device is drastically enhanced with respect to that of the doped monolayer MoS device. Employing first-principle calculations, we reveal that such striking behaviors arise from the presence of electrical transport networks associated with the enhanced interlayer hybridization of S-3p orbitals between adjacent layers activated by vanadium dopants in the bilayer MoS, which is nevertheless absent in its monolayer counterpart. Our work highlights that the effect of dopant not only is confined in the in-plane electrical transport behavior but also could be used to activate out-of-plane interaction between adjacent layers in tailoring the electrical transport of the bilayer transitional metal dichalcogenides, which may bring different applications in electronic and optoelectronic devices.

摘要

层间相互作用会极大地影响过渡金属二硫属化物中的电输运,是控制器件性能的有效途径。然而,在诸如原始MoS等层间耦合较弱的材料中利用层间相互作用来实现层依赖的可调输运行为仍然具有挑战性。在此,我们证明,通过在MoS晶格的Mo位点上进行钒原子的替代掺杂,钒掺杂的单层MoS器件表现出双极场效应特性,而其双层器件表现出重空穴型场效应特征,这与原始的单层和双层MoS器件形成鲜明对比,后两者均表现出类似的空穴型电输运行为。此外,掺杂双层MoS器件的电导相对于掺杂单层MoS器件大幅增强。通过第一性原理计算,我们揭示出这种显著的行为源于与双层MoS中钒掺杂剂激活的相邻层之间增强的S-3p轨道层间杂化相关的电输运网络的存在,而其单层对应物中不存在这种网络。我们的工作突出表明,掺杂剂的作用不仅局限于面内电输运行为,还可用于激活相邻层之间的面外相互作用,以定制双层过渡金属二硫属化物的电输运,这可能在电子和光电器件中带来不同的应用。

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