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基于皮克林乳液组装的MoS空心结构的氢传感器。

Hydrogen Sensors Based on MoS Hollow Architectures Assembled by Pickering Emulsion.

作者信息

Park Chan Ho, Koo Won-Tae, Lee Young Jun, Kim Yoon Hwa, Lee Jiyoung, Jang Ji-Soo, Yun Hongseok, Kim Il-Doo, Kim Bumjoon J

出版信息

ACS Nano. 2020 Aug 25;14(8):9652-9661. doi: 10.1021/acsnano.0c00821. Epub 2020 Jul 31.

DOI:10.1021/acsnano.0c00821
PMID:32700897
Abstract

For rapid hydrogen gas (H) sensing, we propose the facile synthesis of the hollow structure of Pt-decorated molybdenum disulfide (h-MoS/Pt) using ultrathin (mono- or few-layer) two-dimensional nanosheets. The controlled amphiphilic nature of MoS surface produces ultrathin MoS NS-covered polystyrene particles one-step Pickering emulsification. The incorporation of Pt nanoparticles (NPs) on the MoS, followed by pyrolysis, generates the highly porous h-MoS/Pt. This hollow hybrid structure produces sufficiently permeable pathways for H and maximizes the active sites of MoS, while the Pt NPs on the hollow MoS induce catalytic H spillover during H sensing. The h-MoS/Pt-based chemiresistors show sensitive H sensing performances with fast sensing speed (response, 8.1 s for 1% of H and 2.7 s for 4%; and recovery, 16.0 s for both 1% and 4% H at room temperature in the air). These results mark the highest H sensing speed among 2D material-based H sensors operated at room temperature in air. Our fabrication method of h-MoS/Pt structure through Pickering emulsion provides a versatile platform applicable to various 2D material-based hollow structures and facilitates their use in other applications involving surface reactions.

摘要

为了实现快速氢气(H)传感,我们提出了一种简便的合成方法,即使用超薄(单层或几层)二维纳米片制备铂修饰的二硫化钼中空结构(h-MoS₂/Pt)。MoS₂表面可控的两亲性质通过一步Pickering乳化法制备出超薄MoS₂纳米片覆盖的聚苯乙烯颗粒。在MoS₂上引入铂纳米颗粒(NPs),然后进行热解,生成高度多孔的h-MoS₂/Pt。这种中空杂化结构为氢气产生了足够的渗透通道,并使MoS₂的活性位点最大化,而中空MoS₂上的铂纳米颗粒在氢气传感过程中诱导催化氢溢流。基于h-MoS₂/Pt的化学电阻器表现出灵敏的氢气传感性能,传感速度快(在空气中室温下,对1%氢气的响应时间为8.1秒,对4%氢气的响应时间为2.7秒;对1%和4%氢气的恢复时间均为16.0秒)。这些结果标志着在空气中室温下工作的二维材料基氢气传感器中,该传感器具有最高的氢气传感速度。我们通过Pickering乳液制备h-MoS₂/Pt结构的方法提供了一个通用平台,适用于各种二维材料基中空结构,并便于它们在涉及表面反应的其他应用中使用。

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