Ma Z, Dong X L, Ma Y X, Ye R Q, Peng J M, Zhu Z L, Chen M L, Peng X
Dongguan Sixth People's Hospital, Dongguan 523008, China.
Shenzhen Baoan Center for Disease Control and Prevention, Shenzhen 518101, China.
Zhonghua Lao Dong Wei Sheng Zhi Ye Bing Za Zhi. 2020 Jul 20;38(7):504-507. doi: 10.3760/cma.j.cn121094-20200102-00005.
To study the characteristics of the lens turbidity after long-term exposure to low intensity 635nm laser. Cluster sampling method was adopted to select 812 employees in a laser leveler workshop in a city of Guangdong Province from January 2014 to December 2018. They were divided into the control group, diffuse reflection (DR) group and direct vision (DV) group for retrospective observation and analysis of lens turbidity. The laser irradiation intensity of each group was investigated, the position and shape of lens opacity were analyzed, and the influencing factors were statistically analyzed with the repeated measurement data of dichotomy. The laser irradiance and radiant exposure of DV group were between 0.72×10(-4) and 9.92×10(-4) mW/cm(2) and between 2.61×10(-2) and 1.53 J/cm(2), respectively. The subjects were mainly diagnosed with lens turbidity lesion, especially for the DV group. Most of lesions occurred in the pole and periphery of the anterior cortex. The lesions exhibited multipoint patterns with greyish white color. The turbidity rates in DV group (before work and work for 1, 2, 3 years) were 0%, 1.99% (8/402) , 4.98% (20/402) and 6.72% (27/402) , respectively, in the order of observation points. The statistical analysis of single factor effect showed that the turbidity rate was higher in DV group and higher in the second year in the DV group (<0.01) . Multi-factor analysis of the laser effect on the lens showed that the main effect between groups, between the observation point were statistically significant (<0.05) , but no statistical significance in the interaction between group×observation points (>0.05) . Lens turbidity lesion can be caused by long-term exposure to low intensity 635 nm laser, so the product safety classification should be strictly strengthened. It is necessary to strengthen the protection of laser photochemical damage in the production process.
为研究长期暴露于低强度635nm激光后晶状体混浊的特征。采用整群抽样方法，选取2014年1月至2018年12月广东省某城市一家激光调平车间的812名员工。将他们分为对照组、漫反射（DR）组和直视（DV）组，对晶状体混浊情况进行回顾性观察与分析。调查了每组的激光照射强度，分析晶状体混浊的位置和形态，并采用二分法重复测量数据对影响因素进行统计学分析。DV组的激光辐照度和辐照量分别在0.72×10(-4)至9.92×10(-4)mW/cm(2)和2.61×10(-2)至1.53J/cm(2)之间。受试者主要被诊断为晶状体混浊病变，尤其是DV组。大多数病变发生在前皮质的极点和周边。病变呈现多点状，灰白色。DV组（工作前及工作1、2、3年）的混浊率依次为0%、1.99%（8/402）、4.98%（20/402）和6.72%（27/402）。单因素效应的统计分析表明，DV组混浊率较高，且DV组第二年混浊率更高（<0.01）。激光对晶状体影响的多因素分析表明，组间、观察点间的主效应具有统计学意义（<0.05），但组×观察点间的交互作用无统计学意义（>0.05）。长期暴露于低强度635nm激光可导致晶状体混浊病变，因此应严格加强产品安全分级。在生产过程中加强对激光光化学损伤的防护很有必要。
