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通过液滴蒸发结晶法在 CsPbBr 衬底上外延生长的厚度可控的晶圆级单晶 MAPbBr 薄膜。

Thickness-Controlled Wafer-Scale Single-Crystalline MAPbBr Films Epitaxially Grown on CsPbBr Substrates by the Droplet-Evaporated Crystallization Method.

作者信息

Zhang Longzhen, Liu Lin, Zhang Peng, Li Rongzhen, Zhang Guodong, Tao Xutang

机构信息

State Key Laboratory of Crystal Materials, Institute of Crystal Materials, Shandong University, Jinan 250100, P. R. China.

出版信息

ACS Appl Mater Interfaces. 2020 Sep 2;12(35):39834-39840. doi: 10.1021/acsami.0c10224. Epub 2020 Aug 19.

Abstract

The perovskite single-crystalline thin films, which are free of grain boundaries, would be highly desirable in boosting device performance due to their high carrier mobility, low trap density, and large carrier diffusion length. Herein, a facile room-temperature approach to epitaxially grow MAPbBr single-crystalline films on CsPbBr substrates by the droplet-evaporated crystallization method is reported. A large-area continuous MAPbBr single-crystal film about 15 × 15 mm in size has been heteroepitaxially grown on CsPbBr substrates. The surface morphology, composition, and single crystallinity were characterized by a scanning electron microscope, an energy-dispersive spectrometer, an electron probe microanalyzer, and high-resolution X-ray diffractions, respectively. The thickness of the films could be adjusted from 1 to 18 μm by varying the concentration of the solution from 10 to 50 wt %. The epitaxial relationship of MAPbBr (010)∥CsPbBr (010), MAPbBr [101]∥CsPbBr [200] was authenticated using XRD, pole figure, and TEM. The low defect density of 4.6 × 10 cm and high carrier mobility of 261.94 cm V s of the MAPbBr film measured by the SCLC method are comparable to those of bulk single crystals. An on/off ratio of ∼113 was achieved according to current-voltage curves. Our research demonstrates the first large-area single-crystal heterojunction of a hybrid perovskite with an all-inorganic perovskite, which may show unique properties in optoelectronic applications.

摘要

由于钙钛矿单晶薄膜无晶界,具有高载流子迁移率、低陷阱密度和大载流子扩散长度,因此在提高器件性能方面非常理想。本文报道了一种通过液滴蒸发结晶法在CsPbBr衬底上外延生长MAPbBr单晶薄膜的简便室温方法。在CsPbBr衬底上异质外延生长了尺寸约为15×15 mm的大面积连续MAPbBr单晶薄膜。分别用扫描电子显微镜、能谱仪、电子探针微分析仪和高分辨率X射线衍射对其表面形貌、成分和单晶性进行了表征。通过将溶液浓度从10 wt% 变化到50 wt%,薄膜厚度可在1至18 μm之间调节。利用XRD、极图和TEM验证了MAPbBr(010)∥CsPbBr(010)、MAPbBr[101]∥CsPbBr[200]的外延关系。通过SCLC方法测得的MAPbBr薄膜的低缺陷密度4.6×10 cm和高载流子迁移率261.94 cm V s与体单晶相当。根据电流-电压曲线,实现了约113的开/关比。我们的研究展示了第一个混合钙钛矿与全无机钙钛矿的大面积单晶异质结,其在光电子应用中可能表现出独特的性能。

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