Xu Yubing, Wang Xin, Pan Yuzhu, Li Yuwei, Emeka Elemike Elias, Li Qing, Zhang Xiaobing, Chen Jing, Zhao Zhiwei, Lei Wei
School of Electronic Science and Engineering, Joint International Research Laboratory of Information Display and Visualization, Southeast University, Nanjing, China.
Chemistry Department of North West University, Potchefstroom, South Africa.
Front Chem. 2020 Sep 15;8:811. doi: 10.3389/fchem.2020.00811. eCollection 2020.
Organic-inorganic hybrid perovskite single crystals (PSCs) have been emerged as remarkable materials for some optoelectronic applications such as solid-state photodetectors, solar cells and light emitting diodes due to their excellent optoelectronic properties. To decrease the dark current, function layers based on spin-coating method are frequently requested for intrinsic PSCs to block the injected current by forming energy barrier. However, the amorphous function layers suffer from small carrier mobility and high traps density, which limit the speed of the photoelectric response of perovskite devices. This work supposes to grow thick MAPbBr and MAPbI mono-crystalline thin films on the surface of intrinsic MAPbBrCl PSCs substrate by a heteroepitaxial growth technique to act as electron-blocking layers. Meanwhile, C60 and [6,6]-phenyl-C61-butyric acid methyl ester (PCBM) layers are deposited on the opposite surface of substrate PSCs by spin-coating method to block injected holes. This Au-MAPbI-MAPbBr-MAPbBrClPSCs-C60-PCBM-Ag heterostructure can be used as excellent X-ray photodetector (XPD) due to its low dark current density of 6.97 × 10 A cm at -0.5 V bias, high responsivity of 870 mA/W at -100 V bias and X-ray sensitivity as high as 59.7 μC mGy cm at -50 V bias.
有机-无机杂化钙钛矿单晶(PSC)因其优异的光电性能,已成为固态光电探测器、太阳能电池和发光二极管等一些光电器件应用中的卓越材料。为了降低暗电流,本征PSC通常需要基于旋涂法的功能层,通过形成能垒来阻挡注入电流。然而,非晶功能层存在载流子迁移率小和陷阱密度高的问题,这限制了钙钛矿器件的光电响应速度。这项工作旨在通过异质外延生长技术在本征MAPbBrCl PSC衬底表面生长厚的MAPbBr和MAPbI单晶薄膜,作为电子阻挡层。同时,通过旋涂法在衬底PSC的另一面沉积C60和[6,6]-苯基-C61-丁酸甲酯(PCBM)层,以阻挡注入的空穴。这种Au-MAPbI-MAPbBr-MAPbBrClPSCs-C60-PCBM-Ag异质结构可作为优异的X射线光电探测器(XPD),因为其在-0.5 V偏压下的暗电流密度低至6.97×10 A cm,在-100 V偏压下的响应率高达870 mA/W,在-50 V偏压下的X射线灵敏度高达59.7 μC mGy cm 。