Laney Sophia Katharine, Li Tao, Michalska Martyna, Ramirez Francisco, Portnoi Mark, Oh Junho, Tiwari Manish K, Thayne Iain G, Parkin Ivan P, Papakonstantinou Ioannis
Photonic Innovations Lab, Department of Electronic & Electrical Engineering, University College London, Torrington Place, London WC1E 7JE, United Kingdom.
Nanoengineered Systems Laboratory, Department of Mechanical Engineering, University College London, Torrington Place, London WC1E 7JE, United Kingdom.
ACS Nano. 2020 Sep 22;14(9):12091-12100. doi: 10.1021/acsnano.0c05497. Epub 2020 Aug 27.
Periodic nanotube arrays render enhanced functional properties through their interaction with light and matter, but to reach optimal performance for technologically prominent applications, such as wettability or photonics, structural fine-tuning is essential. Nonetheless, a universal and scalable method providing independent dimension control, high aspect ratios, and the prospect of further structural complexity remains unachieved. Here, we answer this need through an atomic layer deposition (ALD)-enabled multiple patterning. Unlike previous methods, the ALD-deposited spacer is applied on the prepatterned target substrate material, serving as an etching mask to generate a multitude of . By concept iteration, we further realize concentric and/or binary nanoarrays in a number of industrially important materials such as silicon, glass, and polymers. To demonstrate the achieved quality and applicability of the structures, we probe how nanotube fine-tuning induces broadband antireflection and present a surface boasting extremely low reflectance of <1% across the wavelength range of 300-1050 nm.
周期性纳米管阵列通过与光和物质的相互作用呈现出增强的功能特性，但要在诸如润湿性或光子学等技术上突出的应用中达到最佳性能，结构微调至关重要。然而，一种提供独立尺寸控制、高纵横比以及进一步结构复杂性前景的通用且可扩展的方法仍未实现。在此，我们通过基于原子层沉积（ALD）的多重图案化来满足这一需求。与先前的方法不同，ALD沉积的间隔层应用于预图案化的目标衬底材料上，用作蚀刻掩膜以生成大量的……通过概念迭代，我们进一步在多种工业上重要的材料（如硅、玻璃和聚合物）中实现了同心和/或二元纳米阵列。为了证明所实现结构的质量和适用性，我们探究了纳米管微调如何诱导宽带抗反射，并展示了在300 - 1050 nm波长范围内具有极低<1%反射率的表面。
