Nakamura Nami, Matsuyama Satoshi, Inoue Takato, Inoue Ichiro, Yamada Jumpei, Osaka Taito, Yabashi Makina, Ishikawa Tetsuya, Yamauchi Kazuto
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan.
RIKEN SPring-8 Center, 1-1-1 Kouto, Sayo, Hygo 679-5148, Japan.
J Synchrotron Radiat. 2020 Sep 1;27(Pt 5):1366-1371. doi: 10.1107/S1600577520009868. Epub 2020 Aug 17.
This paper proposes and demonstrates a simple method using the intensity correlation of X-ray fluorescence to evaluate the focused beam size of an X-ray free-electron laser (XFEL). This method was applied to the sub-micrometre focused XFEL beam at the SPring-8 Angstrom Compact Free Electron Laser, and the beam size evaluated using the proposed method was consistent with that measured using the knife-edge scan method. The proposed method is readily applicable to extremely small X-ray spots and can be applied for the precise diagnostics of sub-10 nm focused X-ray beams which have recently emerged.
本文提出并演示了一种利用X射线荧光强度相关性来评估X射线自由电子激光(XFEL)聚焦束斑尺寸的简单方法。该方法应用于SPring-8埃紧凑型自由电子激光装置上的亚微米聚焦XFEL束,用该方法评估的束斑尺寸与用刀口扫描法测量的结果一致。所提出的方法易于应用于极小的X射线光斑,并且可用于对最近出现的亚10纳米聚焦X射线束进行精确诊断。